Method for producing nitride crystal

US10041186B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10041186-B2
Application numberUS-201615238945-A
CountryUS
Kind codeB2
Filing dateAug 17, 2016
Priority dateMar 10, 2014
Publication dateAug 7, 2018
Grant dateAug 7, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

It is used a crucible containing a flux and a source material, a reaction vessel containing the crucible, an intermediate vessel containing the reaction vessel, and a pressure vessel containing the intermediate vessel and used to fill a gas comprising at least a nitrogen atom. When the flux and the source material are melted by heating to grow the nitride crystal, a vapor of an organic compound is provided in a space outside of the reaction vessel and inside of the intermediate vessel.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of producing a crystal of a nitride of a Group 13 element using a solution comprising a flux and a source material, the method comprising: using a crucible containing said flux and said source material, a reaction vessel containing said crucible, an intermediate vessel containing said reaction vessel, and a pressure vessel containing said intermediate vessel and used to fill at least nitrogen gas; and melting said flux and said source material by heating and introducing said nitrogen gas into said pressure vessel under a pressurized state, said nitrogen gas being supplied into said solution in said crucible through said intermediate vessel and said reaction vessel to grow said crystal of said nitride of said Group 13 element, wherein a vapor of an organic compound is supplied into a space outside of said reaction vessel and inside of said intermediate vessel, said organic compound having a molecular weight greater than that of nitrogen. 2. The method of claim 1 , wherein said organic compound is disposed in said space outside of said reaction vessel and inside of said intermediate vessel, and wherein said organic compound is evaporated by said heating to supply said vapor of said organic compound into said space outside of said reaction vessel and inside of said intermediate vessel. 3. The method of claim 1 , wherein said organic compound is in liquid state at a room temperature. 4. The method of claim 1 , wherein a plurality of said reaction vessels are placed in said intermediate vessel. 5. The method of claim 1 , wherein said organic compound comprises a hydrocarbon or a halogen-containing hydrocarbon. 6. The method of claim 1 , comprising providing a source of supplying said vapor of said organic compound outside of said pressure vessel and supplying said vapor into said pressure vessel with said nitrogen gas from said source to supply said vapor of said organic compound into said space outside of said reaction vessel and inside of said intermediate vessel.

Assignees

Inventors

Classifications

  • Nitrides · CPC title

  • Gallium nitride · CPC title

  • Single-crystal growth from melt solutions using molten solvents (by normal or gradient freezing C30B11/00; by zone-melting C30B13/00; by crystal pulling C30B15/00; on immersed seed crystal C30B17/00; by liquid phase epitaxial growth C30B19/00; under a protective fluid C30B27/00) · CPC title

  • C30B9/12Primary

    Salt solvents, e.g. flux growth · CPC title

  • using as solvent a component of the crystal composition · CPC title

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What does patent US10041186B2 cover?
It is used a crucible containing a flux and a source material, a reaction vessel containing the crucible, an intermediate vessel containing the reaction vessel, and a pressure vessel containing the intermediate vessel and used to fill a gas comprising at least a nitrogen atom. When the flux and the source material are melted by heating to grow the nitride crystal, a vapor of an organic compound…
Who is the assignee on this patent?
Ngk Insulators Ltd
What technology area does this patent fall under?
Primary CPC classification C30B9/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 07 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).