Method and apparatus for controlling plasma near the edge of a substrate

Patent metadata

Field	Value
Publication number	US-10017857-B2
Application number	US-201615144736-A
Country	US
Kind code	B2
Filing date	May 2, 2016
Priority date	May 2, 2015
Publication date	Jul 10, 2018
Grant date	Jul 10, 2018

Abstract

Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber and having a support surface to support a substrate; an inductive coil disposed above the dielectric lid to inductively couple RF energy into the internal processing volume to form a plasma above the substrate support; and a first inductive applicator ring coupled to a lift mechanism to position the first inductive applicator ring within the internal processing volume.

First claim

What is claimed is:

1. An apparatus for processing a substrate, comprising:
a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber;
a substrate support disposed in the process chamber and having a support surface to support a substrate;
an inductive coil disposed above the dielectric lid to inductively couple RF energy into the internal processing volume to form a plasma above the substrate support; and
a first inductive applicator ring, having no physical connection to an RF power source, coupled to a lift mechanism to position the first inductive applicator ring within the internal processing volume to couple RF energy from at least one inductive exciter coil to the plasma.

2. The apparatus of claim 1 , further comprising:
a first inductive exciter coil of the at least one inductive exciter coil, the first inductive exciter coil disposed in the substrate support to couple RF energy to the first inductive applicator ring.

3. The apparatus of claim 2 , further comprising:
a second inductive exciter coil of the at least one inductive exciter coil, the second inductive exciter coil disposed above the dielectric lid concentrically around the inductive coil to couple RF energy to the first inductive applicator ring.

4. The apparatus of claim 3 , further comprising:
a second inductive applicator ring disposed in the substrate support to couple RF energy from the first inductive exciter coil to the plasma.

5. The apparatus of claim 4 , wherein the first inductive applicator ring and the second inductive applicator ring comprise a plurality of metallic segments coupled together via a corresponding plurality of capacitors.

6. The apparatus of claim 5 , wherein the inductive coil is coupled to a first RF power source through a first RF matching network, wherein the first inductive exciter coil is coupled to a second RF power source through a second RF matching network, and wherein the substrate support comprises a bias electrode coupled to a third RF power source through a third RF matching network.

7. The apparatus of claim 6 , wherein the second RF power source is configured to operate at a first frequency and the third RF power source is configured to operate at a second frequency different than the first frequency.

8. The apparatus of claim 6 , wherein the second RF power source and the third RF power source are configured to operate at the same frequency and out of phase.

9. The apparatus of claim 6 , further comprising:
a mesh configured as a chucking electrode to chuck the substrate to the support surface and as an inductive exciter electrode to couple RF energy to the first inductive applicator ring, wherein the mesh is coupled to a fifth RF power source through a fourth matching network.

10. The apparatus of claim 9 , further comprising:
a controller configured to selectively supply RF power from the fifth RF power source or DC power from a DC power source to the mesh to change a functionality of the mesh between providing a chucking force to the substrate and providing RF power to the plasma.

11. The apparatus of claim 4 , wherein the second inductive applicator ring is encapsulated in an insulator.

12. The apparatus of claim 4 , further comprising:
an insulator ring disposed between the first inductive exciter coil and the second inductive applicator ring to space the first inductive exciter coil apart from the second inductive applicator ring.

13. An apparatus for processing a substrate, comprising:
a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber;
a substrate support disposed in the process chamber and having a support surface to support a substrate;
an inductive coil disposed above the dielectric lid to inductively couple RF energy into the internal processing volume to form a plasma above the substrate support;
a first inductive exciter coil disposed above the dielectric lid concentrically around the inductive coil; and
an inductive applicator ring coupled to a lift mechanism to position the inductive applicator ring within the internal processing volume, wherein the inductive applicator ring has no physical connection to an RF power source and is configured to couple RF energy from the first inductive exciter coil to the plasma.

14. The apparatus of claim 13 , wherein the inductive applicator ring comprises a plurality of metallic segments coupled together via a corresponding plurality of capacitors.

15. The apparatus of claim 14 , wherein the plurality of capacitors are spaced axisymetrically about the inductive applicator ring.

16. The apparatus of claim 13 , further comprising:
a second inductive exciter coil disposed in the substrate support, wherein the inductive applicator ring is configured to couple RF energy from the second inductive exciter coil to the plasma proximate an edge of the substrate.

17. The apparatus of claim 16 , wherein the substrate support comprises a bias electrode coupled to a first RF power source through a first RF matching network, wherein the inductive coil is coupled to a second RF power source, wherein the first inductive exciter coil is coupled to a third RF power source through a second RF matching network, and wherein the second inductive exciter coil is coupled to a fourth RF power source through a third RF matching network.

18. The apparatus of claim 17 , wherein at least one of:
the first RF power source operates at a first frequency and the fourth RF power source operates at a second frequency different than the first frequency, or
wherein the first RF power source and the fourth RF power source operate at the same frequency and out of phase, and
wherein at least one of:
the second RF power source operates at a third frequency and the third RF power source operates at a fourth frequency different than the third frequency, or
the second RF power source and third RF power source operate at the same frequency and out of phase.

19. The apparatus of claim 16 , further comprising:
a thermal pad disposed between the second inductive exciter coil and a base layer of the substrate support.

Assignees

• Applied Materials Inc

Inventors

• Nguyen Andrew
• Yang Yang
• Ramaswamy Kartik
• Lane Steven
• Wong Lawrence

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title

• C23C16/505 Primary

  using radio frequency discharges · CPC title