Bipolar transistor device and method of fabrication

US10014398B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10014398-B2
Application numberUS-201715494868-A
CountryUS
Kind codeB2
Filing dateApr 24, 2017
Priority dateMar 12, 2014
Publication dateJul 3, 2018
Grant dateJul 3, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure relates to bipolar transistor devices and a method of fabricating the same. The device comprises a field plate, in an isolation region adjacent to a base-collector junction of said active region. The isolation region comprises a gate terminal arranged to be biased independently of a collector, base or emitter terminal of said transistor.

First claim

Opening claim text (preview).

The invention claimed is: 1. A bipolar transistor, comprising: an active region; a collector region; a sinker region serves to connect a collector terminal; a substrate comprising an isolation region having a first side wall adjacent to said active region, a second side wall adjacent to said sinker region, and a base adjacent to said collector region; a dielectric disposed on said first and second side walls and said base, said dielectric having a first thickness on said first sidewall, a second thickness on said base and a third thickness on said second sidewall, wherein said first thickness is thin relative to said second and third thicknesses, and said third thickness is thick relative to said second and first thicknesses; a field plate formed of a semiconductor material in said isolation region, wherein said field plate is adjacent to a base-collector junction of said active region; wherein said dielectric defines a gate dielectric proximal to said base-collection junction. 2. The bipolar transistor of claim 1 wherein said semiconductor material is a polycrystalline semiconductor material. 3. The bipolar transistor of claim 2 , wherein said polycrystalline semiconductor material comprises a base or an emitter of said bipolar transistor. 4. The bipolar transistor of claim 1 , wherein said gate dielectric and said semiconductor material define a gate terminal of said transistor. 5. The bipolar transistor of claim 4 , said gate terminal is arranged to be biased independently of a collector, base or emitter terminal of said transistor.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Electricity · mapped topic

  • H01L29/737Primary

    Electricity · mapped topic

  • comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions · CPC title

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What does patent US10014398B2 cover?
The disclosure relates to bipolar transistor devices and a method of fabricating the same. The device comprises a field plate, in an isolation region adjacent to a base-collector junction of said active region. The isolation region comprises a gate terminal arranged to be biased independently of a collector, base or emitter terminal of said transistor.
Who is the assignee on this patent?
Nxp Bv
What technology area does this patent fall under?
Primary CPC classification H01L29/737. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).