Production method for polishing-material particles

US10011752B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10011752-B2
Application numberUS-201314426071-A
CountryUS
Kind codeB2
Filing dateSep 3, 2013
Priority dateSep 5, 2012
Publication dateJul 3, 2018
Grant dateJul 3, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol % inclusive.

First claim

Opening claim text (preview).

The invention claimed is: 1. A production method for polishing material particles, the method comprising: forming a salt of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals and forming an inner layer of a precursor of the polishing material particle mainly composing the salt of the element; adding for a predetermined amount of time an aqueous solution prepared with the salt of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals and a salt of Ce in a reaction solution in which the salt of the element formed in the inner layer forming is dispersed, and forming an outer layer of the precursor of the polishing material particle on an outer side of the inner layer, the outer layer including a salt of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals, and a salt of Ce; separating the precursor of the polishing material particle with the outer layer formed in the outer layer forming from the reaction solution; and baking the precursor of the polishing material particle obtained in the separating in the air or in an oxidizing atmosphere, wherein, the reaction solution which forms a surface of the precursor of the polishing material particle in the outer layer forming includes at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals, and a percentage of Ce being 60 mol % or more and 81 mol % or less with respect to a total amount of the at least one element and Ce in the reaction solution, and the total amount of the concentration of the at least one element and Ce in the reaction solution is 1.17 to 50.33 mmol/L. 2. The production method for polishing material particles of claim 1 , wherein, the salt formed in the inner layer forming and the outer layer forming is a basic carbonate. 3. The production method for polishing material particles of claim 2 , wherein, in the inner layer forming, an aqueous solution prepared with a salt of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals, and an urea compound are mixed, a basic carbonate of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Lu, W, Bi, Th, and alkali earth metals is formed, and the inner layer of the precursor of the polishing material particle mainly composed of the basic carbonate of the element is formed.

Assignees

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Classifications

  • Submicrometer sized, i.e. from 0.1-1 micrometer · CPC title

  • Spheres · CPC title

  • Particles consisting of a mixture of two or more inorganic phases · CPC title

  • C09K3/1445Primary

    the coating consisting exclusively of metals · CPC title

  • one phase coated with the other · CPC title

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What does patent US10011752B2 cover?
A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in whic…
Who is the assignee on this patent?
Konica Minolta Inc
What technology area does this patent fall under?
Primary CPC classification C09K3/1445. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).