Device for determining a tilt angle of at least one mirror of a lithography system, and method

Patent metadata

Field	Value
Publication number	US-10007195-B2
Application number	US-201615145114-A
Country	US
Kind code	B2
Filing date	May 3, 2016
Priority date	Nov 11, 2013
Publication date	Jun 26, 2018
Grant date	Jun 26, 2018

Abstract

An apparatus for establishing a tilt angle of at least one mirror of a lithography installation is disclosed. The apparatus includes a pattern generating device ( 6 ) for generating a pattern. The apparatus also includes an image acquisition device for acquiring the generated pattern which was reflected by the mirror. The apparatus further includes a comparator device for providing a comparison result in a manner dependent on a comparison of the acquired pattern with a reference pattern. In addition, the apparatus includes an evaluation device for establishing the tilt angle in a manner dependent on the comparison result. The image acquisition device and the comparator device are provided in the same integrated circuit.

First claim

The invention claimed is:

1. An apparatus configured to establish a tilt angle of a mirror of a lithography installation, the installation comprising:
a first device configured to generate a pattern;
an integrated circuit, comprising:
a second device configured to acquire the generated pattern after the generated pattern is reflected by the mirror; and
a third device which comprises at least one member selected from the group consisting of a correlator and a phase loop, the third device being configured to provide a comparison result in a manner dependent on a comparison of a phase of the acquired pattern with a phase of a reference pattern; and

a fourth device configured to establish the tilt angle depending on the comparison result.

2. The apparatus of claim 1 , wherein the first device is configured to generate a time-varying pattern.

3. The apparatus of claim 1 , wherein the first device is configured to generate first and second patterns, the first generated pattern is time varying in a first direction, and the second generated patterns is time varying in a second direction which is perpendicular to the first direction.

4. The apparatus of claim 3 , wherein the first device comprises first and second sources, the first source is configured to generate the first generated pattern, and the second source is configured to generate the second generated pattern.

5. The apparatus of claim 3 , wherein the second device is configured to alternately acquire the first and second generated patterns, and the third device is configured to alternate between comparing the first acquired pattern to a first reference pattern and comparing the second acquired pattern to a second reference pattern.

6. The apparatus of claim 1 , wherein the first device is configured to generate a pattern which is time varying in mutually perpendicular directions.

7. The apparatus of claim 6 , wherein the first device comprises a single source configured to generate the pattern.

8. The apparatus of claim 1 , wherein the pattern has exactly one period.

9. The apparatus of claim 1 , wherein the first device is configured to generate a chirp signal.

10. The apparatus of claim 1 , wherein the pattern is constant in time.

11. The apparatus of claim 1 , wherein the second device comprises a photosensitive element configured to acquire the pattern continuously.

12. A projection lens, comprising:
the apparatus of claim 1 ,
wherein the projection lens is an EUV lithography projection lens.

13. A lithography installation, comprising:
an illumination system; and
a projection lens comprising the apparatus of claim 1 ,
wherein the lithography installation is an EUV lithography installation.

14. The apparatus of claim 1 , wherein the third device comprises a correlator.

15. The apparatus of claim 1 , wherein the third device comprises a phase loop.

16. An apparatus configured to establish a tilt angle of a mirror of a lithography installation, the installation comprising:
a first device configured to generate first and second patterns, the first pattern being time varying in a first direction, and the second pattern being time varying in a second direction which is perpendicular to the first direction;
a first integrated circuit, comprising:
a second device configured to acquire the first pattern after the first pattern is reflected by the mirror; and
a third device which comprises at least one member selected from the group consisting of a correlator and a phase loop, the third device being configured to provide a comparison result in a manner dependent on a comparison of a phase of the first acquired pattern with a phase of a first reference pattern;

a second integrated circuit, comprising:
a fourth device configured to acquire the second pattern after the second pattern is reflected by the mirror; and
a fifth device configured to provide a comparison result in a manner dependent on a comparison of the second acquired pattern with a second reference pattern; and

a sixth device configured to establish the tilt angle depending on the first and second comparison results.

17. The apparatus of claim 16 , further comprising first and second cameras, wherein the first camera comprises the first integrated circuit, and the second camera comprises the second integrated circuit.

18. A projection lens, comprising:
the apparatus of claim 16 ,
wherein the projection lens is an EUV lithography projection lens.

19. A lithography installation, comprising:
an illumination system; and
a projection lens comprising the apparatus of claim 16 ,
wherein the lithography installation is an EUV lithography installation.

20. A method of establishing a tilt angle of a mirror of a lithography installation, the method comprising:
generating a pattern;
acquiring the pattern after it is reflected by the mirror;
using a device of an integrated circuit to compare a phase of the acquired pattern with a phase of a reference pattern and providing a comparison result; and
establishing the tilt angle in a manner dependent on the comparison result,
wherein acquiring the pattern and comparing the acquired pattern with the reference pattern occur in the circuit, and the device comprises at least one member selected from the group consisting of a correlator and a phase loop.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Horn Jan
• Holz Markus
• Specht Joerg

Classifications

• G03F7/70075 Primary

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70616 Primary

  Monitoring the printed patterns · CPC title

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title