Nozzle and substrate treating apparatus including the same

Patent metadata

Field	Value
Publication number	US-10005092-B2
Application number	US-201615223931-A
Country	US
Kind code	B2
Filing date	Jul 29, 2016
Priority date	Jul 31, 2015
Publication date	Jun 26, 2018
Grant date	Jun 26, 2018

Abstract

A nozzle for supplying a fluid to a substrate, the nozzle including a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flow, wherein the body includes a plurality of liquid discharge holes that discharge the liquid flowing through the liquid discharge line, and a gas discharge hole that discharges the gas flowing through the gas discharge line.

First claim

What is claimed is:

1. A nozzle for supplying a fluid to a substrate, the nozzle comprising:
a body having a liquid discharge line for flow of liquid therethrough and a gas discharge line that surrounds the liquid discharge line for flow of a gas therethrough,
wherein the body comprises:
a plurality of liquid discharge holes for discharge of liquid flow through the liquid discharge line; and
a gas discharge hole for discharge of gas flow through the gas discharge line,

wherein the liquid discharge holes are arranged to surround a central axis of the liquid discharge line,
wherein the liquid discharge holes are parallel to the central axis of the liquid discharge line,
wherein the gas discharge line comprises an outlet line through which the gas is discharged to the outside, wherein a cross-sectional area of the outlet line becomes wider as the outlet line extends downwards and
wherein the outlet line is inclined downwards in a direction that faces the central axis of the liquid discharge line such that the gas is discharged towards the central axis.

2. The nozzle of claim 1 , wherein the gas discharge line further comprises:
an inlet line through which the gas is introduced; and
a middle line that connects the inlet line and the outlet line,
wherein the inlet line is inclined downwards in a direction that faces the central axis of the liquid discharge line.

3. The nozzle of claim 2 , wherein an outer surface of the outlet line extends parallel to an outer surface of the middle line.

4. The nozzle of claim 1 , wherein an inner surface of the outlet line forms an acute angle with respect to the central axis of the liquid discharge line.

5. The nozzle of claim 1 , wherein an inner surface of the outlet line forms an angle of 60 to 70 degrees with respect to the central axis of the liquid discharge line.

6. The nozzle of claim 1 , wherein an outer surface of the outlet line is parallel to a central axis of the liquid discharge line.

7. The nozzle of claim 1 , wherein the liquid discharge holes and the gas discharge hole are spaced apart from each other, and a distance between each of the liquid discharge holes and the gas discharge hole is not more than 0.5 mm.

8. The nozzle of claim 1 , wherein a diameter of each of the liquid discharge holes is not more than 500 μm.

9. The nozzle of claim 1 , wherein each of the liquid discharge holes has a circular shape, and the gas discharge hole has an annular ring shape.

10. The nozzle of claim 1 , further comprising:
a buffer to prevent gas from being discharged while being biased,
wherein the buffer comprises:
a flange that protrudes from an outer surface of the liquid discharge line; and
a plurality of grooves that are vertically formed along a circumference of the flange, and
wherein the grooves are inclined from an outer peripheral surface of the flange to an inside of the flange, and inclined downwards with a vertical direction of the flange.

11. An apparatus for treating a substrate, the apparatus comprising:
a cup providing a treatment space for treating the substrate;
a support unit disposed in the treatment space to support the substrate in the treatment space; and
an injection unit that has a nozzle for discharging a fluid to the substrate,
wherein the nozzle comprises:
a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flows, and

wherein the body comprises:
a plurality of liquid discharge holes that discharge the liquid flowing through the liquid discharge line; and
a gas discharge hole that discharges the gas flowing through the gas discharge line,
wherein the liquid discharge holes are arranged to surround a central axis of the liquid discharge line,
wherein the liquid discharge holes are parallel to the central axis of the liquid discharge line,
wherein the gas discharge line comprises an outlet line through which the gas is discharged to the outside, wherein a cross-sectional area of the outlet line becomes wider as the outlet line extends downwards and
wherein the outlet line is inclined downwards in a direction that faces the central axis of the liquid discharge line such that the gas is discharged towards the central axis.

12. The apparatus of claim 11 , wherein the gas discharge line further comprises:
an inlet line through which gas can be introduced; and
a middle line that connects the inlet line and the outlet line,
wherein the inlet line is inclined downwards in a direction that faces the central axis of the liquid discharge line.

13. The apparatus of claim 12 , wherein an outer surface of the outlet line extends parallel to an outer surface of a middle line.

14. The apparatus of claim 11 , wherein an inner surface of the outlet line is inclined at an acute angle with respect to a central axis of the liquid discharge line.

15. The apparatus of claim 11 , wherein an inner surface of the outlet line forms an angle of 60 to 70 degrees with respect to the central axis of the liquid discharge line to be inclined downwards.

16. The apparatus of claim 11 , wherein the outer surface of the outlet line is parallel to the central axis of the liquid discharge line.

17. The apparatus of claim 11 , wherein the liquid discharge holes and the gas discharge hole are spaced apart from each other, and a distance between the liquid discharge hole and each of the gas discharge holes is not more than 0.5 mm.

18. The apparatus of claim 11 , wherein a diameter of each of the liquid discharge holes is not more than 500 μm.

19. The apparatus of claim 11 , wherein each of the liquid discharge holes has a circular shape, and the gas discharge hole has an annular ring shape.

20. The apparatus of claim 11 , wherein the nozzle further comprises:
a buffer to prevent gas from being discharged while being biased, wherein the buffer comprises:
a flange that protrudes from an outer surface of the liquid discharge line; and
a plurality of grooves that are vertically formed along a circumference of the flange, and
wherein the grooves are inclined from an outer peripheral surface of the flange to the inside of the flange, and is inclined downwards with a vertical direction of the flange.

Assignees

• Semes Co Ltd

Inventors

• Oh Sehoon
• Choi Kihoon
• Kim Jinkyu

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• B05C5/0208

  for applying liquid or other fluent material to separate articles (B05C5/0204 takes precedence) · CPC title

• B05B7/10 Primary

  producing a swirling discharge · CPC title

• B05B7/0815

  with at least one gas jet intersecting a jet constituted by a liquid or a mixture containing a liquid for controlling the shape of the latter · CPC title

• B05B7/061

  with several liquid outlets discharging one or several liquids · CPC title