Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method

Patent metadata

Field	Value
Publication number	US-10001699-B2
Application number	US-201615275719-A
Country	US
Kind code	B2
Filing date	Sep 26, 2016
Priority date	Mar 28, 2012
Publication date	Jun 19, 2018
Grant date	Jun 19, 2018

Abstract

Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm 4 at a spatial frequency of not less than 1 μm −1 .

First claim

The invention claimed is:

1. A transmissive mask blank comprising a light shielding function film to be a transfer pattern on the main surface of a mask blank substrate, wherein the surface of the light shielding function film has a power spectrum density of not more than 10 nm 4 , obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, at a spatial frequency of not less than 1 μm −1 and not more than 10 μm −1 .

2. The transmissive mask blank according to claim 1 , wherein the power spectrum density is not less than 1 nm 4 and not more than 10 nm 4 .

3. The transmissive mask blank according to claim 1 , wherein the transmissive mask blank is a binary mask blank with a light shielding film for shielding exposure light formed on the mask blank substrate.

4. The transmissive mask blank according to claim 1 , wherein the transmissive mask blank is a phase-shift mask blank with a phase shift film for changing the phase difference of exposure light formed on the mask blank substrate.

5. The transmissive mask blank according to claim 4 , wherein the phase-shift mask blank has a structure with a light shielding film for shielding the exposure light formed on the phase shift film.

6. The transmissive mask blank according to claim 1 , wherein the transmissive mask blank is a transmissive mask blank with a resist film, the resist film to be a mask for patterning the light shielding function film, and formed on the light shielding function film.

7. A transmissive mask comprising a light shielding function film pattern provided on the main surface by patterning the light shielding function film of the transmissive mask blank according to claim 1 .

8. A method of manufacturing a semiconductor device, comprising a step of forming a transfer pattern on a transferred substrate by performing a lithography process using an exposure device with the transmissive mask according to claim 7 .

9. A substrate with a multilayer reflective film for use in lithography, comprising:
a multilayer reflective film having a high refractive index layer and a low refractive index layer alternately laminated on a main surface of a mask blank substrate; and,
a protective film on the multilayer reflective film,
wherein a surface of the protective film has a root mean square roughness (Rms) of not more than 0.15 nm, obtained by measuring an area of 1 μm ×1 μm with an atomic force microscope, and has a power spectrum density of not more than 20 nm 4 at a spatial frequency of not less than 1 μm −1 .

10. The substrate with a multilayer reflective film according to claim 9 , wherein the surface of the protective film of the substrate with a multilayer reflective film has a power spectrum density of not more than 20 nm 4 , obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, at a spatial frequency of not less than 1 μm −1 and not more than 10 μm −1 .

11. The substrate with a multilayer reflective film according to claim 9 , wherein the surface of the protective film of the substrate with a multilayer reflective film has a power spectrum density of not more than 9 nm 4 , obtained by measuring an area of 1 μm ×1 μm with an atomic force microscope, at a spatial frequency of not less than 10 μm −1 and not more than 100 μm −1 .

12. A reflective mask blank comprising an absorber film to be a transfer pattern on the protective film of the substrate with a multilayer reflective film according to claim 9 .

13. A reflective mask comprising an absorber pattern provided on the protective film by patterning the absorber film of the reflective mask blank according to claim 12 .

14. A method of manufacturing a semiconductor device, comprising forming a transfer pattern on a transferred substrate by performing a lithography process using an exposure device with the reflective mask according to claim 13 .

Assignees

• Hoya Corp

Inventors

• Orihara Toshihiko
• Hamamoto Kazuhiro
• Kozakai Hirofumi
• Usui Youichi
• Shoki Tsutomu
• Horikawa Junichi

Classifications

• H10P50/694

  characterised by their behaviour during the process, e.g. soluble masks or redeposited masks · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• C03C17/3626

  one layer at least containing a nitride, oxynitride, boronitride or carbonitride · CPC title

• C03C17/3435

  comprising a nitride, oxynitride, boronitride or carbonitride · CPC title

• G03F1/48 Primary

  Protective coatings · CPC title