Method for applying a deposition model in a semiconductor manufacturing process
US-12321101-B2 · Jun 3, 2025 · US
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Zhang Huaichen patents
Zhang Huaichen is listed as an inventor on 6 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Zhang Huaichen |
| Total patents | 6 |
| First publication | Nov 3, 2022 |
| Latest publication | Jun 3, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Methods of metrology
US-2025147436-A1 · May 8, 2025 · US
Methods of determining a mechanical property of a layer applied to a substrate, and associated devices
US-2025028254-A1 · Jan 23, 2025 · US
Surrounding pattern and process aware metrology
US-2025013158-A1 · Jan 9, 2025 · US
Method of determining mark structure for overlay fingerprints
US-2023408931-A1 · Dec 21, 2023 · US
Method for applying a deposition model in a semiconductor manufacturing process
US-2022350254-A1 · Nov 3, 2022 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 6 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70633 | 5 |
| G03F7/70683 | 4 |
| G03F7/705 | 3 |
| G03F7/706839 | 3 |
| G03F9/708 | 2 |