Multi-mirror laser sustained plasma light source
US-10811158-B1 · Oct 20, 2020 · US
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Wang Mark Shi patents
Wang Mark Shi is listed as an inventor on 9 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Mark Shi |
| Total patents | 9 |
| First publication | Jan 19, 2016 |
| Latest publication | Oct 20, 2020 |
Notable patents
Publications ranked by popularity score, then publication date.
Sensor with electrically controllable aperture for inspection and metrology systems
US-10194108-B2 · Jan 29, 2019 · US
Interleaved acousto-optical device scanning for suppression of optical crosstalk
US-10060884-B2 · Aug 28, 2018 · US
Sensor With Electrically Controllable Aperture For Inspection And Metrology Systems
US-2018070040-A1 · Mar 8, 2018 · US
Sensor with electrically controllable aperture for inspection and metrology systems
US-9860466-B2 · Jan 2, 2018 · US
Sensor With Electrically Controllable Aperture For Inspection And Metrology Systems
US-2016334342-A1 · Nov 17, 2016 · US
Interleaved Acousto-Optical Device Scanning For Suppression Of Optical Crosstalk
US-2016290971-A1 · Oct 6, 2016 · US
Interleaved acousto-optical device scanning for suppression of optical crosstalk
US-9395340-B2 · Jul 19, 2016 · US
Variable polarization wafer inspection
US-9239295-B2 · Jan 19, 2016 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 9 |
| Kla Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G01N21/956 | 7 |
| G01N21/9501 | 5 |
| H04N25/715 | 4 |
| G01N2201/12 | 4 |
| G01B11/306 | 4 |