Hybrid x-ray and optical metrology and navigation
US-2025060324-A1 · Feb 20, 2025 · US
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Vuong Vi patents
Vuong Vi is listed as an inventor on 11 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Vuong Vi |
| Total patents | 11 |
| First publication | May 3, 2016 |
| Latest publication | Feb 20, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Hybrid modeling for film metrology
US-2024419885-A1 · Dec 19, 2024 · US
Synthetic wavelengths for endpoint detection in plasma etching
US-2021057195-A1 · Feb 25, 2021 · US
Synthetic wavelengths for endpoint detection in plasma etching
US-10910201-B1 · Feb 2, 2021 · US
Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
US-10692705-B2 · Jun 23, 2020 · US
Advanced optical sensor, system, and methodologies for etch processing monitoring
US-2018286643-A1 · Oct 4, 2018 · US
Method of endpoint detection of plasma etching process using multivariate analysis
US-10002804-B2 · Jun 19, 2018 · US
Advanced optical sensor and method for plasma chamber
US-2017140905-A1 · May 18, 2017 · US
Accurate and fast neural network training for library-based critical dimension (CD) metrology
US-9607265-B2 · Mar 28, 2017 · US
Method of endpoint detection of plasma etching process using multivariate analysis
US-2016172258-A1 · Jun 16, 2016 · US
Recent patents
Latest publications not already listed above.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 10 |
| Jin Wen | 1 |
| Vuong Vi | 1 |
| Bao Junwei | 1 |
| Lee Lie-Quan | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P50/242 | 6 |
| H01L21/3065 | 5 |
| H01J37/32963 | 5 |
| G06F17/16 | 5 |
| H10P74/238 | 4 |