Plasma processing apparatus and plasma processing method
US-12087556-B2 · Sep 10, 2024 · US
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Ui Akio patents
Ui Akio is listed as an inventor on 26 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ui Akio |
| Total patents | 26 |
| First publication | Jun 11, 2015 |
| Latest publication | Sep 10, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Dielectric barrier discharge electrode and dielectric barrier discharge device
US-11497110-B2 · Nov 8, 2022 · US
Plasma disinfection device
US-2022299221-A1 · Sep 22, 2022 · US
Dielectric barrier discharge electrode and dielectric barrier discharge device
US-2022087001-A1 · Mar 17, 2022 · US
Dielectric barrier discharge device
US-2022087002-A1 · Mar 17, 2022 · US
Plasma processing apparatus and plasma processing method
US-10672615-B2 · Jun 2, 2020 · US
Dust collector and air conditioner
US-10518270-B2 · Dec 31, 2019 · US
Gas processing apparatus
US-2019282722-A1 · Sep 19, 2019 · US
Plasma actuator and surface cleaning device
US-2019259579-A1 · Aug 22, 2019 · US
Substrate processing apparatus and substrate processing method
US-10388544-B2 · Aug 20, 2019 · US
Recent patents
Latest publications not already listed above.
Plasma processing apparatus and plasma processing method
US-10381198-B2 · Aug 13, 2019 · US
Dry etching method and method for manufacturing semiconductor device
US-10332906-B2 · Jun 25, 2019 · US
Dry etching method and method for manufacturing semiconductor device
US-2018145086-A1 · May 24, 2018 · US
Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
US-9934944-B2 · Apr 3, 2018 · US
Dust collector and air conditioner
US-2018078950-A1 · Mar 22, 2018 · US
Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam
US-9799482-B2 · Oct 24, 2017 · US
Plasma processing apparatus and plasma processing methdo
US-2017186589-A1 · Jun 29, 2017 · US
Plasma processing apparatus and plasma processing methdo
US-2017169996-A1 · Jun 15, 2017 · US
Substrate processing apparatus and substrate processing method
US-9583360-B2 · Feb 28, 2017 · US
Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
US-2017018409-A1 · Jan 19, 2017 · US
Gas Processing Apparatus
US-2017007958-A1 · Jan 12, 2017 · US
Gas processing apparatus
US-9468698-B2 · Oct 18, 2016 · US
Device manufacturing apparatus and manufacturing method of magnetic device
US-2016196951-A1 · Jul 7, 2016 · US
Plasma processing apparatus and plasma processing method
US-2016027619-A1 · Jan 28, 2016 · US
Gas processing apparatus
US-2015265740-A1 · Sep 24, 2015 · US
Substrate processing apparatus and substrate processing method
US-2015162223-A1 · Jun 11, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Toshiba Kk | 20 |
| Toshiba Memory Corp | 5 |
| Toshiba Energy Systems & Solutions Corp | 2 |
| Ui Akio | 2 |
| Hayashi Hisataka | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P50/242 | 9 |
| H01J37/32091 | 9 |
| H10P50/283 | 8 |
| H01J2237/3341 | 7 |
| H01L21/3065 | 7 |