Diverting agent and method of filling fracture in well using same
US-12410363-B2 · Sep 9, 2025 · US
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Taniguchi Ryosuke patents
Taniguchi Ryosuke is listed as an inventor on 48 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Taniguchi Ryosuke |
| Total patents | 48 |
| First publication | Mar 26, 2015 |
| Latest publication | Sep 9, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Resist composition and pattern forming process
US-12174536-B2 · Dec 24, 2024 · US
Diverting agent and method of filling fracture in well using same
US-12110450-B2 · Oct 8, 2024 · US
Onium salt, chemically amplified negative resist composition, and pattern forming process
US-12060317-B2 · Aug 13, 2024 · US
Diverting agent and method of filling fracture in well using same
US-12054667-B2 · Aug 6, 2024 · US
Diverting agent and method of filling fracture in well using the same
US-11891569-B2 · Feb 6, 2024 · US
Onium salt, chemically amplified negative resist composition, and pattern forming process
US-11773059-B2 · Oct 3, 2023 · US
Diverting agent and method of filling fracture in well using same
US-11674073-B2 · Jun 13, 2023 · US
Resist composition and patterning process
US-11614688-B2 · Mar 28, 2023 · US
Resist composition and patterning process
US-11579526-B2 · Feb 14, 2023 · US
Recent patents
Latest publications not already listed above.
Epoxy compound, resist composition, and pattern forming process
US-11492337-B2 · Nov 8, 2022 · US
Resist composition and pattern forming process
US-2022155687-A1 · May 19, 2022 · US
Onium salt, chemically amplified negative resist composition, and pattern forming process
US-2022113626-A1 · Apr 14, 2022 · US
Sulfonium compound, resist composition, and patterning process
US-11215926-B2 · Jan 4, 2022 · US
Onium salt, chemically amplified negative resist composition, and pattern forming process
US-2021395195-A1 · Dec 23, 2021 · US
Diverting agent and method of filling fracture in well using the same
US-2021363413-A1 · Nov 25, 2021 · US
Diverting agent and method of filling fracture in well using same
US-2021363411-A1 · Nov 25, 2021 · US
Diverting agent and method of filling fracture in well using same
US-2021363412-A1 · Nov 25, 2021 · US
Diverting agent and method of filling fracture in well using same
US-2021309909-A1 · Oct 7, 2021 · US
Diverting agent and method of filling fracture in well using same
US-2021309911-A1 · Oct 7, 2021 · US
Diverting agent and method of filling fracture in well using same
US-2021309910-A1 · Oct 7, 2021 · US
Resist composition and pattern forming process
US-10921710-B2 · Feb 16, 2021 · US
Resist composition and patterning process
US-2020301274-A1 · Sep 24, 2020 · US
Resist composition and patterning process
US-2020301275-A1 · Sep 24, 2020 · US
Epoxy compound, resist composition, and pattern forming process
US-2020283400-A1 · Sep 10, 2020 · US
Resist composition, pattern forming process, polymer, and monomer
US-10310376-B2 · Jun 4, 2019 · US
Sulfonium compound, making method, resist composition, and pattern forming process
US-10248022-B2 · Apr 2, 2019 · US
Sulfonium compound, resist composition, and patterning process
US-2019064665-A1 · Feb 28, 2019 · US
Resist composition and pattern forming process
US-2019033715-A1 · Jan 31, 2019 · US
Sulfonium salt, resist composition, and patterning process
US-10180626-B2 · Jan 15, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Shinetsu Chemical Co | 37 |
| Mitsubishi Chem Corp | 11 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0045 | 33 |
| G03F7/0397 | 27 |
| G03F7/322 | 26 |
| G03F7/0046 | 25 |
| G03F7/004 | 23 |