Metrology mark structure and method of determining metrology mark structure
US-12585201-B2 · Mar 24, 2026 · US
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Socha Robert John patents
Socha Robert John is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Socha Robert John |
| Total patents | 22 |
| First publication | Jun 9, 2015 |
| Latest publication | Mar 24, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Alignment method and associated alignment and lithographic apparatuses
US-2024184221-A1 · Jun 6, 2024 · US
Measurement apparatus and a method for determining a substrate grid
US-11966166-B2 · Apr 23, 2024 · US
Metrology mark structure and method of determining metrology mark structure
US-2022350268-A1 · Nov 3, 2022 · US
Measurement apparatus and a method for determining a substrate grid
US-2021341846-A1 · Nov 4, 2021 · US
Measurement apparatus and a method for determining a substrate grid
US-11079684-B2 · Aug 3, 2021 · US
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
US-10996571-B2 · May 4, 2021 · US
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
US-2020249584-A1 · Aug 6, 2020 · US
Coloring aware optimization
US-10670973-B2 · Jun 2, 2020 · US
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
US-10670975-B2 · Jun 2, 2020 · US
Recent patents
Latest publications not already listed above.
Metrology by reconstruction
US-10437158-B2 · Oct 8, 2019 · US
Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
US-10417359-B2 · Sep 17, 2019 · US
Measurement apparatus and a method for determining a substrate grid
US-2019235391-A1 · Aug 1, 2019 · US
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
US-2018364591-A1 · Dec 20, 2018 · US
Metrology by reconstruction
US-2018364588-A1 · Dec 20, 2018 · US
Inspection method and apparatus, lithographic system and device manufacturing method
US-10132763-B2 · Nov 20, 2018 · US
Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method
US-10054862-B2 · Aug 21, 2018 · US
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
US-2018046091-A1 · Feb 15, 2018 · US
Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
US-2017177760-A1 · Jun 22, 2017 · US
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
US-2016363871-A1 · Dec 15, 2016 · US
Inspection Method and Apparatus, Lithographic System and Device Manufacturing Method
US-2015177166-A1 · Jun 25, 2015 · US
Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions
US-9053280-B2 · Jun 9, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 22 |
| Asml Holding Nv | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70633 | 12 |
| G03F7/70625 | 9 |
| G03F7/70516 | 7 |
| G03F9/7046 | 7 |
| G03F7/70641 | 7 |