Inspection method and apparatus, lithographic system and device manufacturing method

Patent metadata

Field	Value
Publication number	US-10132763-B2
Application number	US-201314416484-A
Country	US
Kind code	B2
Filing date	Jun 18, 2013
Priority date	Jul 23, 2012
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets.

First claim

What is claimed is:

1. An inspection method, comprising:
illuminating a first pattern target having first profile parameters with radiation and detecting scattered radiation to obtain a first pattern signal;
illuminating a second pattern target having second profile parameters, the second pattern target different than the first pattern target, with radiation and detecting scattered radiation to obtain a second pattern signal; and
calculating values of differential pattern profile parameters using a difference between the first pattern signal and the second pattern signal,
wherein the differential pattern profile parameters are differences between the first and second profile parameters, and
wherein the calculating comprises using predetermined information, the predetermined information comprising a first or a higher order derivative of the first pattern signal with respect to one of the first profile parameters.

2. The method of claim 1 , wherein the calculating further comprises calculating the values of the differential pattern profile parameters using a regularized cost function.

3. The method of claim 2 , wherein the cost function is a Bayesian differential cost function.

4. The method of claim 1 , further comprising:
illuminating a first stack target with radiation and detecting scattered radiation to obtain a first stack signal; and
illuminating a second stack target with radiation and detecting scattered radiation to obtain a second stack signal,
wherein the calculating comprises using a difference between the first stack signal and the second stack signal, thereby to reduce an influence of variations between stacks underlying the first and second pattern targets.

5. The method of claim 4 , wherein the calculating further comprises:
calculating values of differential stack parameters using the difference between the first stack signal and the second stack signal and predetermined information as to the dependence of at least one of the first and second stack signals on stack parameters; and
using the calculated values of differential stack parameters, in the calculating values of differential pattern profile parameters.

6. The method of claim 5 , wherein the calculating values of differential stack parameters uses a Bayesian differential cost function.

7. The method of claim 5 , wherein the calculated values of differential stack parameters are kept constant when calculating values of differential pattern profile parameters.

8. An inspection apparatus, comprising:
an optical system configured to illuminate one or more pattern targets with radiation and detect scattered radiation to obtain a corresponding pattern signal; and
a processor configured to calculate values of differential pattern profile parameters using a difference between a first pattern signal detected from a first pattern target having first profile parameters using the optical system and a second pattern signal detected from a second pattern target, different than the first pattern target and having second profile parameters, using the optical system,
wherein the differential pattern profile parameters are differences between the first and second profile parameters, and
wherein the calculating comprises using predetermined information, the predetermined information comprising a first or a higher order derivative of the first pattern signal with respect to one of the first profile parameters.

9. The apparatus of claim 8 , wherein the optical system is further configured to illuminate a first stack target with radiation and detect scattered radiation to obtain a first stack signal and to illuminate a second stack target with radiation and detect scattered radiation to obtain a second stack signal, and wherein the processor is further configured to use, in the calculation, a difference between the first stack signal and the second stack signal, thereby to reduce an influence of variations between stacks underlying the pattern targets.

10. The apparatus of claim 9 , wherein the processor is further configured to calculate values of differential stack parameters using the difference between the first stack signal and the second stack signal and predetermined information as to a dependence of at least one of the first and second stack signals on stack parameters and is further configured to use the calculated values of differential stack parameters, in the calculating values of differential pattern profile parameters.

11. A non-transitory computer program product comprising machine-readable instructions for causing a processor to perform operations comprising:
obtaining a first patterned signal corresponding to detected scattered radiation from a first pattern target having first profile parameters;
obtaining a second patterned signal corresponding to detected scattered radiation from a second pattern target, different than the first pattern target and having second profile parameters; and
calculating values of differential pattern profile parameters using a difference between the first pattern signal and the second pattern signal,
wherein the differential pattern profile parameters are differences between the first and second profile parameters, and
wherein the calculating comprises using predetermined information, the predetermined information comprising a first or a higher order derivative of the first pattern signal with respect to one of the first profile parameters.

12. A lithographic system comprising:
a lithographic apparatus comprising:
an illumination optical system configured to illuminate a pattern; and
a projection optical system configured to project an image of the pattern onto a substrate; and

an inspection apparatus, comprising:
an optical system configured to illuminate one or more pattern targets with radiation and detect scattered radiation to obtain a corresponding pattern signal; and
a processor configured to calculate values of differential pattern profile parameters using a difference between a first pattern signal detected from a first pattern target having first profile parameters using the optical system and a second pattern signal detected from a second pattern target, different than the first pattern target and having second profile parameters, using the optical system,
wherein the differential pattern profile parameters are differences between the first and second profile parameters,
wherein the calculating comprises using predetermined information, the predetermined information comprising a first or a higher order derivative of the first pattern signal with respect to one of the first profile parameters, and
wherein the lithographic apparatus is configured to use the values of differential pattern profile parameters from the inspection apparatus in applying the pattern to further substrates.

13. A non-transitory computer-readable storage device having computer-executable instructions stored thereon, execution of which, by a computing device, causes the computing device to perform operations comprising:
obtaining a first patterned signal corresponding to detected scattered radiation from a first pattern target having first profile parameters;
obtaining a second patterned signal corresponding to detected scattered radiation from a second pattern target, different than the first pattern target and having second profile parameters; and
calculating values of differential pattern profile parameters using a difference between the first pattern signal and the second pattern signal,
wherein the differential pattern profile parameters are differences between the first and second profile parameters, and
wherein the calculating compris

Assignees

• Asml Netherlands Bv

Inventors

• Cramer Hugo Augustinus Joseph
• Socha Robert John
• Tinnemans Patricius Aloysius Jacobus
• Vaessen Jean-Pierre Agnes Henricus Marie

Classifications

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• G03F7/70058

  Mask illumination systems · CPC title

• G01N23/203 Primary

  Measuring back scattering · CPC title

• G03F7/70625 Primary

  Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title

• G03F7/706851

  Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection · CPC title