Color-map method to eliminate qubit frequency crowding in a quantum computing chip
US-12039402-B2 · Jul 16, 2024 · US
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Rosenbluth Alan E patents
Rosenbluth Alan E is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Rosenbluth Alan E |
| Total patents | 25 |
| First publication | Feb 10, 2015 |
| Latest publication | Jul 16, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Color-map method to eliminate qubit frequency crowding in a quantum computing chip
US-2022058509-A1 · Feb 24, 2022 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-10915686-B2 · Feb 9, 2021 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-10872188-B2 · Dec 22, 2020 · US
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns
US-2020074032-A1 · Mar 5, 2020 · US
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns
US-2020074031-A1 · Mar 5, 2020 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-10437950-B2 · Oct 8, 2019 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-10394984-B2 · Aug 27, 2019 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-10210295-B2 · Feb 19, 2019 · US
Figurative models calibrated to correct errors in process models
US-2018322228-A1 · Nov 8, 2018 · US
Recent patents
Latest publications not already listed above.
Figurative models calibrated to correct errors in process models
US-10120963-B1 · Nov 6, 2018 · US
Method and program product for designing source and mask for lithography
US-9857676-B2 · Jan 2, 2018 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-2017270230-A1 · Sep 21, 2017 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-2017147733-A1 · May 25, 2017 · US
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US-2017147734-A1 · May 25, 2017 · US
Source, target and mask optimization by incorporating contour based assessments and integration over process variations
US-9651856-B2 · May 16, 2017 · US
Synthesizing low mask error enhancement factor lithography solutions
US-9395622-B2 · Jul 19, 2016 · US
Source, target and mask optimization by incorporating contour based assessments and integration over process variations
US-2016109795-A1 · Apr 21, 2016 · US
Method and program product for designing source and mask for lithography
US-2016103389-A1 · Apr 14, 2016 · US
Mask that provides improved focus control using orthogonal edges
US-9310674-B2 · Apr 12, 2016 · US
Source, target and mask optimization by incorporating countour based assessments and integration over process variations
US-9250535-B2 · Feb 2, 2016 · US
Synthesizing low mask error enhancement factor lithography solutions
US-2015234970-A1 · Aug 20, 2015 · US
Mask that provides improved focus control using orthogonal edges
US-2015234269-A1 · Aug 20, 2015 · US
Mask design method, program, and mask design system
US-8959462-B2 · Feb 17, 2015 · US
Source-mask optimization for a lithography process
US-8954898-B2 · Feb 10, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| IBM | 22 |
| Globalfoundries Inc | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/36 | 19 |
| G03F7/705 | 15 |
| G06F30/367 | 10 |
| G03F7/70283 | 10 |
| G03F7/70091 | 10 |