High-order rotational symmetry unit-based nonlinear geometric phase metasurface
US-12505266-B2 · Dec 23, 2025 · US
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Pu Mingbo patents
Pu Mingbo is listed as an inventor on 27 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Pu Mingbo |
| Total patents | 27 |
| First publication | May 9, 2019 |
| Latest publication | Dec 23, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
High-order rotational symmetry unit-based nonlinear geometric phase metasurface
US-2025165661-A1 · May 22, 2025 · US
Metasurface-based imaging system, design method, and detector
US-12306424-B2 · May 20, 2025 · US
Metasurface-based imaging system, design method, and detector
US-2025116801-A1 · Apr 10, 2025 · US
Ultra-large area scanning reactive ion etching machine and etching method thereof
US-12272530-B2 · Apr 8, 2025 · US
Ultra-wide angle broadband polarization imaging system based on metasurface, and detection apparatus
US-12228710-B1 · Feb 18, 2025 · US
Ultra-wide angle broadband polarization imaging system based on metasurface, and detection apparatus
US-2025044558-A1 · Feb 6, 2025 · US
Mask topology optimization method and system for surface plasmon near-field photolithography
US-12092960-B2 · Sep 17, 2024 · US
Near-field lithography immersion system, immersion unit and interface module thereof
US-12078937-B1 · Sep 3, 2024 · US
Near-field lithography immersion system, immersion unit and interface module thereof
US-2024272558-A1 · Aug 15, 2024 · US
Recent patents
Latest publications not already listed above.
Mask topology optimization method and system for surface plasmon near-field photolithography
US-2024264535-A1 · Aug 8, 2024 · US
Multifunctional lithography device
US-11868055-B2 · Jan 9, 2024 · US
Visible light-transparent and radiative-cooling multilayer film
US-11754352-B2 · Sep 12, 2023 · US
Method for etching curved substrate
US-11724962-B2 · Aug 15, 2023 · US
Intelligent correction device control system for super-resolution lithography precision mask
US-11714358-B2 · Aug 1, 2023 · US
Method of fabricating micro-nano structure
US-11675273-B2 · Jun 13, 2023 · US
Method for etching curved substrate
US-2023174416-A1 · Jun 8, 2023 · US
Multifunctional lithography device
US-2023129163-A1 · Apr 27, 2023 · US
Method of fabricating micro-nano structure
US-2023132100-A1 · Apr 27, 2023 · US
Intelligent correction device control system for super-resolution lithography precision mask
US-2023126995-A1 · Apr 27, 2023 · US
Sub-wavelength structural material having patch type array and compatibility of low detectability for infrared, laser, and microwave
US-11592602-B2 · Feb 28, 2023 · US
Ultra-large area scanning reactive ion etching machine and etching method thereof
US-2022068617-A1 · Mar 3, 2022 · US
Methods and apparatuses for coating photoresist
US-11061330-B2 · Jul 13, 2021 · US
Visible light-transparent and radiative-cooling multilayer film
US-2021003354-A1 · Jan 7, 2021 · US
Sub-wavelength structural material having compatibility of low detectability for infrared, laser, and microwave
US-2020249376-A1 · Aug 6, 2020 · US
Methods and apparatuses for coating photoresist
US-2020233306-A1 · Jul 23, 2020 · US
Broadband electromagnetic wave phase modulating method and meta surface sub-wavelength structure
US-2019137793-A1 · May 9, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Inst Optics & Electronics Cas | 27 |
| The Inst Of Optics And Electronics Chinese Academy Of Sciences | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G02B1/002 | 7 |
| G03F7/7035 | 6 |
| G03F7/162 | 4 |
| G03F7/70433 | 4 |
| H01J2237/3341 | 4 |