Method of fabricating micro-nano structure

Patent metadata

Field	Value
Publication number	US-11675273-B2
Application number	US-202117997102-A
Country	US
Kind code	B2
Filing date	Apr 28, 2021
Priority date	Apr 29, 2020
Publication date	Jun 13, 2023
Grant date	Jun 13, 2023

Abstract

Provided is a method of fabricating a micro-nano structure, including: forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate; pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained. The method solves the problem of limited diffraction, improves the processing resolution by reducing the transmission loss of evanescent waves through reflective light field enhancement, and reduces the difficulty and cost of mask processing and pattern defects by using shallow pressurizing in combination with exposure.

First claim

What is claimed is:

1. A method of fabricating a micro-nano structure, comprising:
forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate;
pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and
exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained.

2. The method according to claim 1 , wherein the pressurizing the substrate and a mask having a micro-nano pattern to attach to each other comprises:
pressurizing the substrate and the mask having the micro-nano pattern to attach to each other through a precise pressure transfer, such that the fluid polymer layer is uniformly pressurized into the light-transmission area of the mask.

3. The method according to claim 2 , wherein in the pressurizing the substrate and the mask having the micro-nano pattern to attach to each other through a precise pressure transfer, a method of the precise pressure transfer comprises piston-type mechanical transfer, piezoelectric actuator transfer, gas film transfer, and gas pressure transfer.

4. The method according to claim 1 , wherein before the pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, the method further comprises:
leveling and contacting the substrate with the mask having the micro-nano pattern.

5. The method according to claim 4 , wherein the curing the fluid polymer in the light-transmission area further comprises:
placing the substrate in a developing solution for development, and removing the fluid polymer not sensing light and not cured, so as to obtain the micro-nano structure.

6. The method according to claim 1 , wherein a micro-nano pattern of the mask further comprises an anti-adhesion layer, and a material of the anti-adhesion layer comprises diamond-like carbon thin film or fluorine-doped silane.

7. The method according to claim 1 , wherein the fluid polymer layer is a high-resolution fluid polymer material, comprising fluorine-doped silicon-based copolymer or derivative, vinyl ether-based copolymer, acrylic-based copolymer, calixarene-based molecular glass, acetal polymer with high acid hydrolysis activity, or poly p-hydroxystyrene-based copolymer.

8. The method according to claim 1 , wherein a method of forming the reflective layer on the surface of the substrate comprises molecular beam epitaxy in combination with low temperature annealing, co-sputtering, and high temperature sputtering.

9. The method according to claim 8 , wherein forming the fluid polymer layer on the surface of the substrate comprises spin-coating the fluid polymer on a surface of the reflective layer to form the fluid polymer layer.

10. The method according to claim 8 , wherein the reflective layer comprises a low-loss silver reflective layer and a low-loss aluminum reflective layer.

11. A method of fabricating a micro-nano optical printing based on reflective light field enhancement, comprising the following steps:
step 1, depositing a low-loss reflective layer on a surface of a substrate;
step 2, spin-coating a high-resolution fluid polymer material on a surface of the reflective layer;
step 3, preparing an anti-adhesion layer on a surface of a micro-nano mask;
step 4, leveling and contacting, by a mechanical device, the substrate with the high-resolution fluid polymer material spin-coated on the surface of the reflective layer with a surface of a micro-nano mask pattern;
step 5, squeezing, by using a method of precise pressure transfer, a shallow surface layer of the high-resolution fluid polymer material into a light-transmission area of the mask pattern;
step 6, exposing, wherein a light field local passing through the mask pattern is located in the light-transmission area under an effect of the reflective layer, such that a local part of the fluid polymer material between the fluid polymer material squeezed into the light-transmission area of the mask pattern and the fluid polymer material reaching the reflective layer senses light and being cured; and
step 7, placing the substrate into a developing solution for development after demolding to remove the fluid polymer material not sensing light and not cured, so as to obtain a replicated pattern.

12. The method according to claim 11 , wherein a method of fabricating the low-loss reflective layer in step 1 is molecular beam epitaxy in combination with low temperature annealing, co-sputtering, or high temperature sputtering.

13. The method according to claim 11 , wherein the high-resolution fluid polymer material in step 2 is a fluorine-doped silicon-based copolymer or derivative, a vinyl ether-based copolymer, an acrylic-based copolymer, calixarene-based molecular glass, an acetal polymer with high acid hydrolysis activity, or a poly p-hydroxystyrene-based copolymer.

14. The method according to claim 11 , wherein the anti-adhesion layer in step 3 is a diamond-like carbon thin film or a fluorine-doped silane.

15. The method according to claim 11 , wherein the method of precise pressure transfer in step 5 is piston-type mechanical transfer, piezoelectric actuator transfer, gas film transfer, or gas pressure transfer.

Assignees

• Inst Optics & Electronics Cas

Inventors

• Luo Xiangang
• Guo Yinghui
• Pu Mingbo
• Li Xiong
• Ma Xiaoliang
• Gao Ping

Classifications

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/70433 Primary

  Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• G03F7/7035

  Proximity or contact printers · CPC title