Optical system for a lithographic projection exposure apparatus
US-12585193-B2 · Mar 24, 2026 · US
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Patra Michael patents
Patra Michael is listed as an inventor on 116 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Patra Michael |
| Total patents | 116 |
| First publication | Jan 15, 2015 |
| Latest publication | Mar 24, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for determining a position of a mirror
US-12516963-B2 · Jan 6, 2026 · US
Method for the interferometric determination of the surface shape of a test object
US-2025383198-A1 · Dec 18, 2025 · US
Digital micromirror device for an illumination optical component of a projection exposure system
US-12339589-B2 · Jun 24, 2025 · US
Illumination optical unit for projection lithography
US-2025044702-A1 · Feb 6, 2025 · US
Method for determining a position of a mirror
US-2024255319-A1 · Aug 1, 2024 · US
Optical component group, in particular for use in an illumination device of a microlithographic projection exposure apparatus
US-2024255856-A1 · Aug 1, 2024 · US
Euv illumination device and method for operating a microlithographic projection exposure apparatus designed for operation in the euv
US-2024248410-A1 · Jul 25, 2024 · US
Optical system for a lithographic projection exposure apparatus
US-2024012333-A1 · Jan 11, 2024 · US
Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography
US-11720028-B2 · Aug 8, 2023 · US
Recent patents
Latest publications not already listed above.
Digital micromirror device for an illumination optical component of a projection exposure system
US-2023221649-A1 · Jul 13, 2023 · US
Stop for arrangement in a constriction of an EUV illumination beam
US-11350513-B2 · May 31, 2022 · US
Optical illumination system for guiding euv radiation
US-2022163897-A1 · May 26, 2022 · US
Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for euv lithography
US-2022057717-A1 · Feb 24, 2022 · US
Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask
US-11137688-B2 · Oct 5, 2021 · US
Stop for arrangement in a constriction of an euv illumination beam
US-2021084741-A1 · Mar 18, 2021 · US
Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask
US-2021055661-A1 · Feb 25, 2021 · US
Illumination optic for projection lithography
US-10928733-B2 · Feb 23, 2021 · US
Optical assembly for guiding an output beam of a free electron laser
US-10928734-B2 · Feb 23, 2021 · US
Optical system for a projection exposure apparatus
US-10871717-B2 · Dec 22, 2020 · US
Illumination optic for projection lithography
US-2020348600-A1 · Nov 5, 2020 · US
Method for the microlithographic production of microstructured components
US-10802403-B2 · Oct 13, 2020 · US
Optical system for a projection exposure apparatus
US-2020218164-A1 · Jul 9, 2020 · US
Projection exposure method and projection exposure apparatus for microlithography
US-10678144-B2 · Jun 9, 2020 · US
Projection exposure method and projection exposure apparatus for microlithography
US-2020096877-A1 · Mar 26, 2020 · US
Optical assembly for guiding an output beam of a free electron laser
US-2020019064-A1 · Jan 16, 2020 · US
Projection exposure method and projection exposure apparatus for microlithography
US-10514611-B2 · Dec 24, 2019 · US
Method for the microlithographic production of microstructured components
US-2019243248-A1 · Aug 8, 2019 · US
Projection exposure method and projection exposure apparatus for microlithography
US-2019204756-A1 · Jul 4, 2019 · US
Illumination system for EUV projection lithography
US-10310381-B2 · Jun 4, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 114 |
| Carl Zeiss Smart Optics Gmbh | 2 |
| tooz technologies GmbH | 2 |
| Patra Michael | 2 |
| Deguenther Markus | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70116 | 64 |
| G03F7/702 | 51 |
| G03F7/70075 | 48 |
| G02B26/0833 | 34 |
| G03F7/70191 | 30 |