Digital micromirror device for an illumination optical component of a projection exposure system

Patent metadata

Field	Value
Publication number	US-12339589-B2
Application number	US-202318175195-A
Country	US
Kind code	B2
Filing date	Feb 27, 2023
Priority date	Sep 30, 2020
Publication date	Jun 24, 2025
Grant date	Jun 24, 2025

Abstract

A micromirror array is a constituent part of an illumination-optical component of a projection exposure apparatus for projection lithography. A multiplicity of micromirrors are in groups in a plurality of mirror modules, each of which has a rectangular module border. The mirror modules are in module columns. At least some of the module columns are displaced with respect to one another along a column boundary line so that at least some of the mirror modules adjacent to one another over the boundary line are arranged displaced with respect to one another. Their module border sides running transversely to the boundary line are not aligned flush with one another. This micromirror array can have a relatively standardized production and can have a relatively small reflection folding angle on the object if the micromirror array represents a final illumination-optical component upstream of a reflective object to be illuminated.

First claim

What is claimed is:

1. A micromirror array, comprising:
a multiplicity of micromirrors arranged in groups in a plurality of mirror modules,
wherein:
each mirror module has a rectangular module border;
the mirror modules are arranged in module columns;
at least some of the module columns are displaced with respect to one another along a column boundary line;
at least some of the mirror modules adjacent to one another over the boundary line are displaced with respect to one another so that their module border sides transverse to the boundary line are not flush with one another;
the module columns are displaced with respect to one another along the column boundary line so that the micromirror array is configured to reflect a specified overall illumination light beam and so that a protrusion of sections of the mirror modules not used to reflect illumination light enable small reflection folding angles,

wherein a distance of a gap that is present between immediately neighboring micromirrors of different mirror modules is greater than a distance between immediately neighboring mirrors within a mirror module.

2. The micromirror array of claim 1 , wherein:
the micromirror array is arrangeable on a carrier having a near border side closest to an arrangement region of the mirror modules of the micromirror array on the carrier; and
at least one of the boundary lines between the module columns has a smallest angle ranging between 0° and 90° with a normal of a carrier border direction of the near border side.

3. The micromirror array of claim 2 , wherein at least one of the boundary lines between the module columns has a smallest angle ranging between 0° and 45° with the normal of the carrier border direction of the near border side.

4. The micromirror array of claim 1 , wherein the mirror modules are arranged in a periodic, non-Cartesian grid.

5. A component, comprising:
a micromirror array according to claim 1 , wherein the component is an illumination-optical component.

6. An optical assembly, comprising:
a micromirror array according to claim 1 ; and
an object holder configured to hold a lithography mask in an object field,
wherein:
the object holder is displaceable along a displacement direction;
at one of the boundary lines between the module columns has a smallest angle ranging between 0° and 90° with a displacement direction.

7. A unit, comprising:
a micromirror array according to claim 1 ,
wherein the unit is an illumination optical unit, and the illumination-optical component is configured to transfer illumination light into an object field.

8. An optical system, comprising:
an illumination optical unit configured to transfer illumination light to an object field; and
a projection optical unit configured to image the object field into an image field,
wherein the illumination optical unit comprises a micromirror according to claim 1 .

9. An illumination system, comprising:
a light source configured to provide illumination light; and
an illumination optical unit configured to transfer the illumination light to an object field, wherein the illumination optical unit comprises a micromirror according to claim 1 .

10. A projection exposure apparatus, comprising:
a light source configured to provide illumination light;
an illumination optical unit configured to transfer the illumination light to an object field; and
a projection optical unit configured to image the object field into an image field,
wherein the illumination optical unit comprises a micromirror according to claim 1 .

11. A method, comprising:
using an illumination optical unit to transfer the illumination light to an object field; and
using a projection optical unit configured to image the object field into an image field,
wherein the illumination optical unit comprises a micromirror according to claim 1 .

12. A micromirror array, comprising:
a multiplicity of micromirrors arranged in groups in a plurality of mirror modules,
wherein:
each mirror module has a rectangular module border;
the mirror modules are arranged in module columns;
at least some of the module columns are displaced with respect to one another along a column boundary line;
at least some of the mirror modules adjacent to one another over the boundary line are displaced with respect to one another so that their module border sides transverse to the boundary line are not flush with one another; and
the displacement of the module columns displaced with respect to one another along the column boundary line is less than half an extent of the respective mirror module along the column boundary line,

wherein a distance of a gap that is present between immediately neighboring micromirrors of different mirror modules is greater than a distance between immediately neighboring mirrors within a mirror module.

13. The micromirror array of claim 12 , wherein:
the micromirror array is arrangeable on a carrier having a near border side closest to an arrangement region of the mirror modules of the micromirror array on the carrier; and
at least one of the boundary lines between the module columns has a smallest angle ranging between 0° and 90° with a normal of a carrier border direction of the near border side.

14. The micromirror array of claim 13 , wherein at least one of the boundary lines between the module columns has a smallest angle ranging between 0° and 45° with the normal of the carrier border direction of the near border side.

15. The micromirror array of claim 12 , wherein the mirror modules are arranged in a periodic, non-Cartesian grid.

16. A component, comprising:
a micromirror array according to claim 12 , wherein the component is an illumination-optical component.

17. An optical assembly, comprising:
a micromirror array according to claim 12 ; and
an object holder configured to hold a lithography mask in an object field,
wherein:
the object holder is displaceable along a displacement direction;
at one of the boundary lines between the module columns has a smallest angle ranging between 0° and 90° with a displacement direction.

18. A unit, comprising:
a micromirror array according to claim 12 ,
wherein the unit is an illumination optical unit, and the illumination-optical component is configured to transfer illumination light into an object field.

19. An optical system, comprising:
an illumination optical unit configured to transfer illumination light to an object field; and
a projection optical unit configured to image the object field into an image field,
wherein the illumination optical unit comprises a micromirror according to claim 12 .

20. An illumination system, comprising:
a light source configured to provide illumination light; and
an illumination optical unit configured to transfer the illumination light to an object field, wherein the illumination optical unit comprises a micromirror according to claim 12 .

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Patra Michael

Classifications

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/70075

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title

• G02B5/09

  Multifaceted or polygonal mirrors {, e.g. polygonal scanning mirrors; Fresnel mirrors} · CPC title

• G03F7/70275 Primary

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title