Apparatus and method for removing a single particulate from a substrate
US-12517442-B2 · Jan 6, 2026 · US
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Oster Jens patents
Oster Jens is listed as an inventor on 15 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Oster Jens |
| Total patents | 15 |
| First publication | Aug 31, 2017 |
| Latest publication | Jan 6, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method, device and computer program for repairing a mask defect
US-12493238-B2 · Dec 9, 2025 · US
Method for processing dc marks for repairing lithography masks
US-2024411223-A1 · Dec 12, 2024 · US
Method and device for analysing an image of a microlithographic microstructured sample
US-2024393269-A1 · Nov 28, 2024 · US
Apparatus and method for removing a single particulate from a substrate
US-2024295833-A1 · Sep 5, 2024 · US
Apparatus and method for removing a single particulate from a substrate
US-11886126-B2 · Jan 30, 2024 · US
Apparatus for analyzing and/or processing a sample with a particle beam and method
US-2023238209-A1 · Jul 27, 2023 · US
Method, device and computer program for repairing a mask defect
US-2022308443-A1 · Sep 29, 2022 · US
Apparatus and method for removing a single particulate from a substrate
US-2022011682-A1 · Jan 13, 2022 · US
Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask
US-11079674-B2 · Aug 3, 2021 · US
Recent patents
Latest publications not already listed above.
Method and device for permanently repairing defects of absent material of a photolithographic mask
US-10732501-B2 · Aug 4, 2020 · US
Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask
US-2019391482-A1 · Dec 26, 2019 · US
Method and device for permanently repairing defects of absent material of a photolithographic mask
US-2019317395-A1 · Oct 17, 2019 · US
Method and device for permanently repairing defects of absent material of a photolithographic mask
US-10372032-B2 · Aug 6, 2019 · US
Method and device for permanently repairing defects of absent material of a photolithographic mask
US-2017248842-A1 · Aug 31, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 15 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/72 | 13 |
| G03F1/74 | 9 |
| G03F1/84 | 7 |
| G01N23/203 | 5 |
| G06N3/0442 | 4 |