Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film
US-2026003262-A1 · Jan 1, 2026 · US
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Ono Yosuke patents
Ono Yosuke is listed as an inventor on 38 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ono Yosuke |
| Total patents | 38 |
| First publication | May 26, 2016 |
| Latest publication | Jan 1, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film
US-12386252-B2 · Aug 12, 2025 · US
Pellicle, exposure original plate, exposure device, and method of manufacturing pellicle
US-2024402590-A1 · Dec 5, 2024 · US
Pellicle, exposure original plate, exposure device and pellicle production method
US-2024377726-A1 · Nov 14, 2024 · US
Pellicle
US-2024377725-A1 · Nov 14, 2024 · US
Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film
US-2024103357-A1 · Mar 28, 2024 · US
Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
US-11852968-B2 · Dec 26, 2023 · US
Pellicle film, pellicle, original plate for exposure, exposure device, method of producing pellicle, and method of producing semiconductor device
US-2023036846-A1 · Feb 2, 2023 · US
Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device
US-11243463-B2 · Feb 8, 2022 · US
Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle
US-11204547-B2 · Dec 21, 2021 · US
Recent patents
Latest publications not already listed above.
Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method
US-11137677-B2 · Oct 5, 2021 · US
Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device
US-11042085-B2 · Jun 22, 2021 · US
Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle
US-2021080824-A1 · Mar 18, 2021 · US
Pellicle manufacturing method and method for manufacturing photomask with pellicle
US-10895805-B2 · Jan 19, 2021 · US
Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device
US-2021011372-A1 · Jan 14, 2021 · US
Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
US-2020401039-A1 · Dec 24, 2020 · US
Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
US-10606169-B2 · Mar 31, 2020 · US
Pellicle, pellicle production method and exposure method using pellicle
US-10585348-B2 · Mar 10, 2020 · US
Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method
US-2020064729-A1 · Feb 27, 2020 · US
Pellicle, production method thereof, exposure method
US-10488751-B2 · Nov 26, 2019 · US
Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device
US-2019129300-A1 · May 2, 2019 · US
Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicle
US-2019121229-A1 · Apr 25, 2019 · US
Pellicle film, pellicle frame, pellicle, and method for producing same
US-10261411-B2 · Apr 16, 2019 · US
Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device
US-10216081-B2 · Feb 26, 2019 · US
Film containing a resin having a thiourethane bond and uses thereof
US-10106660-B2 · Oct 23, 2018 · US
Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device
US-10108084-B2 · Oct 23, 2018 · US
Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
US-2018239242-A1 · Aug 23, 2018 · US
Pellicle manufacturing method and method for manufacturing photomask with pellicle
US-2018046071-A1 · Feb 15, 2018 · US
Support frame for pellicles
US-9841670-B2 · Dec 12, 2017 · US
Pellicle film, pellicle frame, pellicle, and method for producing same
US-2017285461-A1 · Oct 5, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Mitsui Chemicals Inc | 36 |
| Nippon Light Metal Co | 2 |
| Aist | 2 |
| Tazmo Co Ltd | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/62 | 32 |
| G03F1/64 | 31 |
| G03F7/70983 | 19 |
| G03F7/2004 | 18 |
| G03F1/66 | 14 |