Acid polishing composition and method of polishing a substrate having enhanced defect inhibition
US-10781343-B2 · Sep 22, 2020 · US
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Mosley David patents
Mosley David is listed as an inventor on 18 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Mosley David |
| Total patents | 18 |
| First publication | Jul 14, 2015 |
| Latest publication | Sep 22, 2020 |
Notable patents
Publications ranked by popularity score, then publication date.
Acid polishing composition and method of polishing a substrate having enhanced defect inhibition
US-2020239734-A1 · Jul 30, 2020 · US
Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
US-10584265-B2 · Mar 10, 2020 · US
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
US-10508221-B2 · Dec 17, 2019 · US
Cmp slurry compositions containing silica with trimethylsulfoxonium cations
US-2019185713-A1 · Jun 20, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-10316218-B2 · Jun 11, 2019 · US
Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
US-2019092972-A1 · Mar 28, 2019 · US
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
US-2019092970-A1 · Mar 28, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-10221336-B2 · Mar 5, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-2019062593-A1 · Feb 28, 2019 · US
Recent patents
Latest publications not already listed above.
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-2018362805-A1 · Dec 20, 2018 · US
Low-abrasive CMP slurry compositions with tunable selectivity
US-10119048-B1 · Nov 6, 2018 · US
Cmp polishing composition comprising positive and negative silica particles
US-2018094166-A1 · Apr 5, 2018 · US
Aqueous compositions of stabilized aminosilane group containing silica particles
US-9803108-B1 · Oct 31, 2017 · US
Aqueous compositions of low abrasive silica particles
US-9783702-B1 · Oct 10, 2017 · US
Method of polishing semiconductor substrate
US-9534148-B1 · Jan 3, 2017 · US
Method of polishing semiconductor substrate
US-9293339-B1 · Mar 22, 2016 · US
Gallium formulated ink and methods of making and using same
US-9080068-B2 · Jul 14, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Materials Cmp Holdings Inc | 17 |
| Rohm & Haas Elect Mat | 2 |
| Rohm And Hass Electronic Mat Cmp Holdings Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09G1/02 | 17 |
| H10P95/062 | 13 |
| C09K3/1409 | 12 |
| C09K3/1463 | 12 |
| B24B37/044 | 11 |