Radiation-sensitive composition and method for forming resist pattern
US-2025383603-A9 · Dec 18, 2025 · US
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Maruyama Ken patents
Maruyama Ken is listed as an inventor on 74 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Maruyama Ken |
| Total patents | 74 |
| First publication | Mar 3, 2015 |
| Latest publication | Dec 18, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Radiation-sensitive resin composition and method for forming resist pattern
US-2025377590-A1 · Dec 11, 2025 · US
Radiation-sensitive resin composition and method for forming resist pattern
US-12422748-B2 · Sep 23, 2025 · US
Radiation-sensitive composition, method for forming resist pattern, polymer, and compound
US-2025258431-A1 · Aug 14, 2025 · US
Radical scavenger additives for metal oxide based resists and precursor solutions
US-2025251662-A1 · Aug 7, 2025 · US
Radiation-sensitive resin composition and pattern formation method
US-2025237948-A1 · Jul 24, 2025 · US
Radiation-sensitive composition, method of forming resist pattern, and polymer
US-2025237950-A1 · Jul 24, 2025 · US
Resist pattern formation method
US-2025224679-A1 · Jul 10, 2025 · US
Radiation-Sensitive Composition and Method for Forming Resist Pattern
US-2025155802-A1 · May 15, 2025 · US
Radiation-sensitive composition and method for forming resist pattern
US-2025147421-A1 · May 8, 2025 · US
Recent patents
Latest publications not already listed above.
Production method for semiconductor substrates
US-2024411228-A1 · Dec 12, 2024 · US
Radiation-sensitive resin composition and method for forming pattern
US-2024385520-A1 · Nov 21, 2024 · US
Radiation-sensitive resin composition, method of forming resist pattern, and polymer
US-2024377742-A1 · Nov 14, 2024 · US
Radiation-sensitive resin composition and method for forming pattern
US-2024369928-A1 · Nov 7, 2024 · US
Radiation-sensitive composition and method of forming resist pattern
US-2024329523-A1 · Oct 3, 2024 · US
Radiation-sensitive resin composition, method for forming resist pattern and compound
US-12092957-B2 · Sep 17, 2024 · US
Radiation-sensitive composition and resist pattern-forming method
US-2024152050-A1 · May 9, 2024 · US
Radiation-sensitive resin composition and pattern formation method
US-2024152048-A1 · May 9, 2024 · US
Radiation-sensitive resin composition, method of forming resist pattern, and compound
US-11966161-B2 · Apr 23, 2024 · US
Radiation-sensitive composition and method of forming resist pattern
US-2024126167-A1 · Apr 18, 2024 · US
Method for manufacturing semiconductor substrate and composition
US-2024030030-A1 · Jan 25, 2024 · US
Method for manufacturing semiconductor substrate and composition
US-2024021429-A1 · Jan 18, 2024 · US
Radiation-sensitive resin composition and method for forming pattern
US-2024004288-A1 · Jan 4, 2024 · US
Radiation-sensitive composition and method of forming resist pattern
US-2023400768-A1 · Dec 14, 2023 · US
Cell stack management system
US-2023402865-A1 · Dec 14, 2023 · US
Radiation-sensitive resin composition and method for forming resist pattern
US-2023341772-A1 · Oct 26, 2023 · US
Radiation-sensitive resin composition and method for forming resist pattern
US-11747725-B2 · Sep 5, 2023 · US
Method for producing film
US-11745216-B2 · Sep 5, 2023 · US
Radiation-sensitive resin composition and pattern formation method
US-2023273519-A1 · Aug 31, 2023 · US
Composition, underlayer film, and directed self-assembly lithography process
US-2023259032-A1 · Aug 17, 2023 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Jsr Corp | 72 |
| Maruyama Ken | 6 |
| Kasahara Kazuki | 2 |
| Matsuda Yasuhiko | 1 |
| Kawakami Takanori | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0397 | 61 |
| G03F7/0045 | 57 |
| G03F7/0392 | 49 |
| G03F7/0046 | 40 |
| G03F7/004 | 40 |