Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method
US-9261789-B2 · Feb 16, 2016 · US
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Maruyama Ken patents
Maruyama Ken holds 6 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 6 |
| Recent patents | 0 |
| First publication | Mar 3, 2015 |
| Latest publication | Feb 16, 2016 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Radiation-sensitive composition and compound
US-9200098-B2 · Dec 1, 2015 · US
Radiation-sensitive resin composition, compound and producing method of compound
US-9120726-B2 · Sep 1, 2015 · US
Radiation-sensitive resin composition
US-9104102-B2 · Aug 11, 2015 · US
Method for forming resist pattern and composition for forming protective film
US-9052600-B2 · Jun 9, 2015 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method
US-9261789-B2 · Feb 16, 2016 · US
Radiation-sensitive composition and compound
US-9200098-B2 · Dec 1, 2015 · US
Radiation-sensitive resin composition, compound and producing method of compound
US-9120726-B2 · Sep 1, 2015 · US
Radiation-sensitive resin composition
US-9104102-B2 · Aug 11, 2015 · US
Method for forming resist pattern and composition for forming protective film
US-9052600-B2 · Jun 9, 2015 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| G03F7/0397 | 5 |
| G03F7/0045 | 4 |
| G03F7/11 | 3 |
| G03F7/0046 | 3 |
| G03F7/0392 | 3 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Physics | 6 |
| Chemistry & Metallurgy | 5 |
| Electricity | 3 |
| Cross-Sectional Technologies | 1 |