Selective etching of silicon-containing material relative to metal-doped boron films
US-12550651-B2 · Feb 10, 2026 · US
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Mallick Abhijit Basu patents
Mallick Abhijit Basu is listed as an inventor on 409 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Mallick Abhijit Basu |
| Total patents | 409 |
| First publication | Mar 17, 2015 |
| Latest publication | Feb 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Selective photo-resist re-shaping
US-2026033298-A1 · Jan 29, 2026 · US
Vapor-phase precursor seeding for diamond film deposition
US-12534797-B2 · Jan 27, 2026 · US
Remote icp radical deposition of tunable low-k dielectric films
US-2026018411-A1 · Jan 15, 2026 · US
Large area gapfill using volumetric expansion
US-12525446-B2 · Jan 13, 2026 · US
Amorphous multi-metal-doped film for hardmask application
US-2025379052-A1 · Dec 11, 2025 · US
Methods for gap filling vertical and lateral features with plasma inhibition
US-2025372385-A1 · Dec 4, 2025 · US
Vapor-phase precursor seeding for diamond film deposition
US-2025361605-A1 · Nov 27, 2025 · US
Processes for depositing SiB films
US-12482646-B2 · Nov 25, 2025 · US
Microwave plasma-enhanced deposition of silicon oxide
US-2025357103-A1 · Nov 20, 2025 · US
Recent patents
Latest publications not already listed above.
Bottom-up gap fill using non-conformal poisoning
US-2025357109-A1 · Nov 20, 2025 · US
High density carbon films for patterning applications
US-12463036-B2 · Nov 4, 2025 · US
Electronic device fabrication using area-selective deposition
US-12438050-B2 · Oct 7, 2025 · US
Grounding plate for stress tuning high density and modulus films
US-2025308850-A1 · Oct 2, 2025 · US
Low temperature graphene growth
US-12381086-B2 · Aug 5, 2025 · US
Seam performance improvement for large area gapfill
US-2025230540-A1 · Jul 17, 2025 · US
Nanocrystalline diamond and ultra-nanocrystalline diamond films by catalytic cvd
US-2025207248-A1 · Jun 26, 2025 · US
Methods to reduce UNCD film roughness
US-12327733-B2 · Jun 10, 2025 · US
Deposition of conformal and gap-fill amorphous silicon thin-films
US-12325910-B2 · Jun 10, 2025 · US
Seam performance improvement using hydroxylation for gapfill
US-2025066913-A1 · Feb 27, 2025 · US
Adhesion improvements in metal-containing hardmasks
US-2025054748-A1 · Feb 13, 2025 · US
Reactive-ion deposition processes for dielectric material formation
US-2025046602-A1 · Feb 6, 2025 · US
Defect free germanium oxide gap fill
US-12198936-B2 · Jan 14, 2025 · US
High pressure oxidation of metal films
US-12173413-B2 · Dec 24, 2024 · US
In-situ etch and inhibition in plasma enhanced atomic layer deposition
US-2024420934-A1 · Dec 19, 2024 · US
Nested-loop plasma enhanced atomic layer deposition
US-2024420952-A1 · Dec 19, 2024 · US
Formation of silicon-and-metal-containing materials for hardmask applications
US-2024387174-A1 · Nov 21, 2024 · US
Formation of silicon-and-metal-containing materials for hardmask applications
US-2024387190-A1 · Nov 21, 2024 · US
Processes for depositing sib films
US-2024339316-A1 · Oct 10, 2024 · US
Low temperature growth of transition metal chalcogenides
US-12110584-B2 · Oct 8, 2024 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 409 |
| Nat Univ Singapore | 15 |
| Mallick Abhijit Basu | 2 |
| Applied Mat | 1 |
| Ingle Nitin | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6336 | 185 |
| H01L21/02274 | 99 |
| H10P14/6339 | 90 |
| H10P14/69215 | 87 |
| H10P14/24 | 81 |