Correction for flare effects in lithography system
US-10423745-B2 · Sep 24, 2019 · US
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Li Jiangwei patents
Li Jiangwei is listed as an inventor on 4 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Li Jiangwei |
| Total patents | 4 |
| First publication | Jan 20, 2015 |
| Latest publication | Sep 24, 2019 |
Notable patents
Publications ranked by popularity score, then publication date.
Method and apparatus for cost function based simultaneous OPC and SBAR optimization
US-9619607-B2 · Apr 11, 2017 · US
Correction for flare effects in lithography system
US-2015058815-A1 · Feb 26, 2015 · US
Multivariable solver for optical proximity correction
US-8938699-B2 · Jan 20, 2015 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/705 | 3 |
| G03F7/70941 | 2 |
| G06F17/5045 | 2 |
| G06F30/20 | 2 |
| G06F30/30 | 2 |