Methods of forming interconnect structures
US-12568803-B2 · Mar 3, 2026 · US
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Haverty Michael patents
Haverty Michael is listed as an inventor on 36 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Haverty Michael |
| Total patents | 36 |
| First publication | May 14, 2020 |
| Latest publication | Mar 3, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Oxidants and strained-ring precursors
US-12550643-B2 · Feb 10, 2026 · US
Selective deposition of liner layer
US-2026026326-A1 · Jan 22, 2026 · US
Systems and methods for depositing low-K dielectric films
US-12500080-B2 · Dec 16, 2025 · US
Precursor, gas mixture, and method for depositing a low k dielectric film
US-2025313950-A1 · Oct 9, 2025 · US
Electron-withdrawing functional groups on si-chalcogen precursors
US-2025299944-A1 · Sep 25, 2025 · US
Enabling thick mosi growth
US-2025270693-A1 · Aug 28, 2025 · US
Methods for depositing blocking layers on conductive surfaces
US-12281382-B2 · Apr 22, 2025 · US
Optimum material stacks for semiconductor contacts
US-2025125157-A1 · Apr 17, 2025 · US
Titanium nitride gapfill processes for semiconductor devices
US-2025046600-A1 · Feb 6, 2025 · US
Recent patents
Latest publications not already listed above.
Chalcogen precursors for deposition of silicon nitride
US-12142477-B2 · Nov 12, 2024 · US
Crested barrier device and synaptic element
US-12141688-B2 · Nov 12, 2024 · US
Methods for forming low-k dielectric materials
US-2024363337-A1 · Oct 31, 2024 · US
Methods of forming interconnect structures
US-2024355675-A1 · Oct 24, 2024 · US
Methods of forming interconnect structures
US-2024297073-A1 · Sep 5, 2024 · US
Systems and methods for depositing low-k dielectric films
US-2024087881-A1 · Mar 14, 2024 · US
Systems and methods for depositing low-k dielectric films
US-2024087880-A1 · Mar 14, 2024 · US
Tantalum doped ruthenium layers for interconnects
US-2024071927-A1 · Feb 29, 2024 · US
Ruthenium film deposition using low valent metal precursors
US-11821070-B2 · Nov 21, 2023 · US
Metal Surface Blocking Molecules for Selective Deposition
US-2023317516-A1 · Oct 5, 2023 · US
Methods for depositing blocking layers on conductive surfaces
US-2023295794-A1 · Sep 21, 2023 · US
Low contact resistance unsilicides for semiconductor applications
US-2023268399-A1 · Aug 24, 2023 · US
Silicides, alloys and intermetallics to minimize resistance
US-2023268414-A1 · Aug 24, 2023 · US
Conductive oxide silicides for reliable low contact resistance
US-2023268415-A1 · Aug 24, 2023 · US
Chalcogen precursors for deposition of silicon nitride
US-2023253201-A1 · Aug 10, 2023 · US
Methods for depositing blocking layers on conductive surfaces
US-11702733-B2 · Jul 18, 2023 · US
Chalcogen precursors for deposition of silicon nitride
US-11658025-B2 · May 23, 2023 · US
Integrated contact silicide with tunable work functions
US-11626288-B2 · Apr 11, 2023 · US
Doped tantalum-containing barrier films
US-2023070489-A1 · Mar 9, 2023 · US
Integrated contact silicide with tunable work functions
US-2023034058-A1 · Feb 2, 2023 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 36 |
| Nat Univ Singapore | 7 |
| Applied Materlals Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/45553 | 13 |
| H10P14/6339 | 12 |
| H10P14/69433 | 11 |
| H10P14/6682 | 11 |
| H10P14/6336 | 10 |