Laser system for source material conditioning in an euv light source
US-2025318038-A1 · Oct 9, 2025 · US
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Fomenkov Igor Vladimirovich patents
Fomenkov Igor Vladimirovich is listed as an inventor on 27 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Fomenkov Igor Vladimirovich |
| Total patents | 27 |
| First publication | Jan 28, 2016 |
| Latest publication | Oct 9, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Guiding device and associated system
US-12389519-B2 · Aug 12, 2025 · US
Laser system for source material conditioning in an EUV light source
US-12369244-B2 · Jul 22, 2025 · US
Oxygen-loss resistant top coating for optical elements
US-12287455-B2 · Apr 29, 2025 · US
Laser system for target metrology and alteration in an euv light source
US-2024419083-A1 · Dec 19, 2024 · US
System for monitoring a plasma
US-12171053-B2 · Dec 17, 2024 · US
Laser system for target metrology and alteration in an EUV light source
US-12078934-B2 · Sep 3, 2024 · US
Prolonging optical element lifetime in an euv lithography system
US-2024160109-A1 · May 16, 2024 · US
Guiding device and associated system
US-2024085796-A1 · Mar 14, 2024 · US
Prolonging optical element lifetime in an EUV lithography system
US-11846887-B2 · Dec 19, 2023 · US
Recent patents
Latest publications not already listed above.
Guiding device and associated system
US-11822252-B2 · Nov 21, 2023 · US
Prolonging optical element lifetime in an euv lithography system
US-2022291591-A1 · Sep 15, 2022 · US
Oxygen-loss resistant top coating for optical elements
US-2022260756-A1 · Aug 18, 2022 · US
Laser system for source material conditioning in an euv light source
US-2022192000-A1 · Jun 16, 2022 · US
Prolonging optical element lifetime in an EUV lithography system
US-11340532-B2 · May 24, 2022 · US
System for monitoring a plasma
US-2022151052-A1 · May 12, 2022 · US
System for monitoring a plasma
US-11266002-B2 · Mar 1, 2022 · US
Laser system for target metrology and alteration in an euv light source
US-2021263422-A1 · Aug 26, 2021 · US
Guiding device and associated system
US-2021141311-A1 · May 13, 2021 · US
Prolonging optical element lifetime in an euv lithography system
US-2021109452-A1 · Apr 15, 2021 · US
Guiding device and associated system
US-10955749-B2 · Mar 23, 2021 · US
System for monitoring a plasma
US-2020344868-A1 · Oct 29, 2020 · US
Wavelength-based optical filtering
US-10663866-B2 · May 26, 2020 · US
Guiding device and associated system
US-2020089124-A1 · Mar 19, 2020 · US
Wavelength-based optical filtering
US-2018081280-A1 · Mar 22, 2018 · US
Target for extreme ultraviolet light source
US-9462668-B2 · Oct 4, 2016 · US
Target for extreme ultraviolet light source
US-2016029471-A1 · Jan 28, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 27 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70033 | 23 |
| H05G2/008 | 18 |
| G03F7/70916 | 17 |
| G03F7/70175 | 13 |
| H05G2/0094 | 7 |