Systems and methods for predicting post-etch stochastic variation
US-2026093172-A1 · Apr 2, 2026 · US
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Feng Mu patents
Feng Mu is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Feng Mu |
| Total patents | 22 |
| First publication | Nov 21, 2019 |
| Latest publication | Apr 2, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Modelling of multi-level etch processes
US-2025355364-A1 · Nov 20, 2025 · US
Etch bias characterization and method of using the same
US-12468232-B2 · Nov 11, 2025 · US
Prediction data selection for model calibration to reduce model prediction uncertainty
US-12443111-B2 · Oct 14, 2025 · US
Determining metrics for a portion of a pattern on a substrate
US-12339591-B2 · Jun 24, 2025 · US
Etching systems, models, and manufacturing processes
US-2024385530-A1 · Nov 21, 2024 · US
Method for converting metrology data
US-2024377343-A1 · Nov 14, 2024 · US
Method for improving a process for a patterning process
US-11977336-B2 · May 7, 2024 · US
Apparatus and method for selecting high quality images from raw images automatically
US-2023298158-A1 · Sep 21, 2023 · US
Etch bias characterization and method of using the same
US-11675274-B2 · Jun 13, 2023 · US
Recent patents
Latest publications not already listed above.
Determining metrics for a portion of a pattern on a substrate
US-2023161269-A1 · May 25, 2023 · US
Methods of tuning process models
US-11614690-B2 · Mar 28, 2023 · US
Method for determining stochastic variation of printed patterns
US-11567413-B2 · Jan 31, 2023 · US
Methods for improving process based contour information of structure in image
US-2022299881-A1 · Sep 22, 2022 · US
Prediction data selection for model calibration to reduce model prediction uncertainty
US-2022276563-A1 · Sep 1, 2022 · US
Instant tuning method for accelerating resist and etch model calibration
US-11314172-B2 · Apr 26, 2022 · US
Gauge selection for model calibration
US-2022113632-A1 · Apr 14, 2022 · US
Modeling post-exposure processes
US-2021294218-A1 · Sep 23, 2021 · US
Method for improving a process for a patterning process
US-2021208507-A1 · Jul 8, 2021 · US
Instant tuning method for accelerating resist and etch model calibration
US-2021048751-A1 · Feb 18, 2021 · US
Methods of tuning process models
US-2019369498-A1 · Dec 5, 2019 · US
Etch bias characterization and method of using the same
US-2019354020-A1 · Nov 21, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 22 |
| Asml Netherlands | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/705 | 19 |
| G03F7/70625 | 18 |
| G03F7/706839 | 8 |
| G03F7/70516 | 6 |
| G03F7/706837 | 6 |