Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model
US-12566368-B2 · Mar 3, 2026 · US
Asml Netherlands holds 4 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 4 |
| Recent patents | 4 |
| First publication | Sep 5, 2023 |
| Latest publication | Mar 3, 2026 |
Year-over-year patent counts for this assignee.
Latest publications where this party is an assignee.
US-12566368-B2 · Mar 3, 2026 · US
US-12443111-B2 · Oct 14, 2025 · US
US-12399313-B2 · Aug 26, 2025 · US
US-11747739-B2 · Sep 5, 2023 · US
Representative or frequently cited publications from precomputed assignee stats.
US-12566368-B2 · Mar 3, 2026 · US
US-12443111-B2 · Oct 14, 2025 · US
US-12399313-B2 · Aug 26, 2025 · US
US-11747739-B2 · Sep 5, 2023 · US
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Physics | 4 |