Composition and method for polysilicon CMP
US-12157834-B2 · Dec 3, 2024 · US
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Brosnan Sarah patents
Brosnan Sarah is listed as an inventor on 12 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Brosnan Sarah |
| Total patents | 12 |
| First publication | Aug 30, 2018 |
| Latest publication | Dec 3, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Polishing pad employing polyamine and cyclohexanedimethanol curatives
US-11845156-B2 · Dec 19, 2023 · US
Composition and method for polysilicon cmp
US-2021062043-A1 · Mar 4, 2021 · US
Self-stopping polishing composition and method for bulk oxide planarization
US-10920107-B2 · Feb 16, 2021 · US
Polishing pad employing polyamine and cyclohexanedimethanol curatives
US-2021008687-A1 · Jan 14, 2021 · US
Self-stopping polishing composition and method for bulk oxide planarization
US-2020190361-A1 · Jun 18, 2020 · US
Self-stopping polishing composition and method for bulk oxide planarization
US-10619075-B2 · Apr 14, 2020 · US
Self-stopping polishing composition and method for bulk oxide planarization
US-10619076-B2 · Apr 14, 2020 · US
CMP compositions containing polymer complexes and agents for STI applications
US-10584266-B2 · Mar 10, 2020 · US
Cmp compositions containing polymer complexes and agents for sti applications
US-2019284434-A1 · Sep 19, 2019 · US
Recent patents
Latest publications not already listed above.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Cabot Microelectronics Corp | 12 |
| Cmc Mat Inc | 2 |
| Cmc Mat Llc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09G1/02 | 10 |
| H10P95/062 | 8 |
| H01L21/31053 | 7 |
| H10W10/011 | 6 |
| H10W10/10 | 6 |