Polishing pad and method for preparing semiconductor device using the same
US-12362232-B2 · Jul 15, 2025 · US
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Ahn Jaein patents
Ahn Jaein is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ahn Jaein |
| Total patents | 25 |
| First publication | Nov 29, 2018 |
| Latest publication | Jul 15, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Polishing pad comprising window similar in hardness to polishing layer
US-11964360-B2 · Apr 23, 2024 · US
Porous polishing pad and process for producing the same all fees
US-11772236-B2 · Oct 3, 2023 · US
Porous polyurethane polishing pad and process for producing the same
US-11766759-B2 · Sep 26, 2023 · US
Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad
US-11628535-B2 · Apr 18, 2023 · US
Polishing pad having excellent airtightness
US-11571783-B2 · Feb 7, 2023 · US
Polishing pad with improved fluidity of slurry and process for preparing same
US-11534888-B2 · Dec 27, 2022 · US
Leakage-proof polishing pad and process for preparing the same
US-11267098-B2 · Mar 8, 2022 · US
Polishing pad and method for preparing semiconductor device using the same
US-2022059401-A1 · Feb 24, 2022 · US
Polishing pad having excellent airtightness
US-2021291314-A1 · Sep 23, 2021 · US
Recent patents
Latest publications not already listed above.
Polishing pad, preparation method thereof, and preparation method of semiconductor device using same
US-2021162560-A1 · Jun 3, 2021 · US
Polishing pad, preparation method thereof, and preparation method of semiconductor device using same
US-2021154797-A1 · May 27, 2021 · US
Polishing pad that minimizes occurrence of defects and process for preparing the same
US-11000935-B2 · May 11, 2021 · US
Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad
US-2021094144-A1 · Apr 1, 2021 · US
Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad
US-2021094143-A1 · Apr 1, 2021 · US
Polishing pad that minimizes occurrence of defects and process for preparing the same
US-2020306921-A1 · Oct 1, 2020 · US
Polishing pad comprising window similar in hardness to polishing layer
US-2020164483-A1 · May 28, 2020 · US
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
US-10518383-B2 · Dec 31, 2019 · US
Polishing pad with improved fluidity of slurry and process for preparing same
US-2019389033-A1 · Dec 26, 2019 · US
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
US-10513007-B2 · Dec 24, 2019 · US
Porous polyurethane polishing pad and process for producing the same
US-2019321937-A1 · Oct 24, 2019 · US
Porous polishing pad and process for producing the same
US-2019314954-A1 · Oct 17, 2019 · US
Leakage-proof polishing pad and process for preparing the same
US-2019111542-A1 · Apr 18, 2019 · US
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
US-2018339394-A1 · Nov 29, 2018 · US
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
US-2018339393-A1 · Nov 29, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Skc Co Ltd | 15 |
| Skc Solmics Co Ltd | 6 |
| Sk Enpulse Co Ltd | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| B24B37/24 | 21 |
| B24B37/22 | 17 |
| B24B37/20 | 15 |
| H10P52/402 | 13 |
| H10P52/403 | 13 |