Semiconductor device and method for fabricating the same
US-2026047073-A1 · Feb 12, 2026 · US
of capacitors having no potential barriers
of capacitors having no potential barriers · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10D1/041 |
| Official title | {of capacitors having no potential barriers} |
| Display label | of capacitors having no potential barriers |
| Total patents | 70 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 5 |
| 2016 | 5 |
| 2017 | 2 |
| 2018 | 2 |
| 2019 | 2 |
| 2020 | 3 |
| 2021 | 5 |
| 2022 | 3 |
| 2023 | 4 |
| 2024 | 4 |
| 2025 | 22 |
| 2026 | 13 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method of manufacturing semiconductor device
US-2026047362-A1 · Feb 12, 2026 · US
System and methods for a dual interlayer dielectric
US-2026040525-A1 · Feb 5, 2026 · US
Capacitor, method of manufacturing the capacitor, electronic device including the capacitor, and method of manufacturing the electronic device
US-2025386525-A1 · Dec 18, 2025 · US
Metal-insulator-metal device structures and methods of forming the same
US-2025380435-A1 · Dec 11, 2025 · US
Planar and 3d capacitors in interconnect region
US-2025372505-A1 · Dec 4, 2025 · US
Capacitors for a microelectronic device having increased density and related methods
US-2025372302-A1 · Dec 4, 2025 · US
Semiconductor device
US-2025366171-A1 · Nov 27, 2025 · US
High-density stacked capacitor and method
US-2025359300-A1 · Nov 20, 2025 · US
Capacitor structure and method for fabricating the capacitor
US-2025351390-A1 · Nov 13, 2025 · US
Method of forming a capacitor or an ionic capacitor, with an electrode comprising a noble metal
US-2025331205-A1 · Oct 23, 2025 · US
Energy storage component comprising a capacitor or an ionic capacitor, with a buffer layer in a peripheral region
US-2025331206-A1 · Oct 23, 2025 · US
PECVD of SiBN thin films with low leakage current
US-12451345-B2 · Oct 21, 2025 · US
Semiconductor memory device
US-2025311233-A1 · Oct 2, 2025 · US
Memory, electronic device, and memory manufacturing method
US-2025285658-A1 · Sep 11, 2025 · US
Semiconductor device
US-2025275232-A1 · Aug 28, 2025 · US
Methods for forming asymmetrical dipoles for capacitors, related devices, and related systems
US-2025273558-A1 · Aug 28, 2025 · US
Methods for forming semiconductor structures comprising hafnium zirconium oxide layers and metal oxide layers, and associated structures, and systems
US-2025273458-A1 · Aug 28, 2025 · US
Method of manufacturing semiconductor device and semiconductor device
US-2025248057-A1 · Jul 31, 2025 · US
Isotropic thermal atomic layer etch of zirconium and hafnium oxides
US-2025226213-A1 · Jul 10, 2025 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H10D1/041?
- CPC H10D1/041 is the Cooperative Patent Classification code for “of capacitors having no potential barriers.”
- How many patents are filed under CPC H10D1/041 (of capacitors having no potential barriers)?
- Our database includes 70 publications tagged with this CPC code.
- Is patent activity under CPC H10D1/041 growing?
- Publication counts under this code: 4 in 2024 vs 22 in 2025 (latest complete years).