Devices and methods for non-planar photolithography of nail polish

Patent metadata

Field	Value
Publication number	US-10684547-B2
Application number	US-201715402681-A
Country	US
Kind code	B2
Filing date	Jan 10, 2017
Priority date	Jan 10, 2017
Publication date	Jun 16, 2020
Grant date	Jun 16, 2020

Abstract

Systems and methods for patterning nail polish are disclosed. In one embodiment, the system includes a source of light, and a programmable mask that can selectively transmit light to a photoresist nail polish. In some embodiments, the programmable mask is a liquid crystal display (LCD) or a digital light processing screen (DLP). The system may also include a controller configured for controlling the light transmission properties of the programmable mask.

First claim

The embodiments of the disclosure in which an exclusive property or privilege is claimed are defined as follows:

1. A nail polish system, comprising:
a housing having an opening configured to receive a fingernail of a finger, the housing containing:
a source of light;
a programmable mask configured to selectively transmit or reflect light from the source of light to a photoresist nail polish on the fingernail, the programmable mask having a variable curvature; and
an actuator configured to bend the programmable mask such that the variable curvature of the programmable mask approximates a curvature of the fingernail received within the opening of the housing and underneath the programmable mask.

2. The nail polish system of claim 1 , further comprising the photoresist nail polish.

3. The nail polish system of claim 1 , wherein the programmable mask is a liquid crystal display (LCD) or a digital light processing screen (DLP).

4. The nail polish system of claim 3 , further comprising a controller configured to control light transmission properties of the programmable mask.

5. The nail polish system of claim 3 , further comprising a lens configured to focus light onto the photoresist nail polish.

6. The nail polish system of claim 1 , wherein the programmable mask is a patterned foil.

7. The nail polish system of claim 1 , further comprising:
a controller; and
a distance detector configured to measure a distance between the programmable mask and the photoresist nail polish on the fingernail received within the opening of the housing, and to provide the distance to the controller,
wherein the controller causes the actuator to bend the programmable mask based upon the distance between the programmable mask and the photoresist nail polish.

8. The nail polish system of claim 7 , wherein the distance detector is an infrared range finder or a light detection and ranging (LIDAR) device.

9. The nail polish system of claim 1 , further comprising:
a lens contained within the housing and configured to focus light onto the photoresist nail polish.

10. The nail polish system of claim 1 ,
wherein the actuator is a first actuator,
the nail polish system further comprising a second actuator connected to a different side of the programmable mask from the first actuator, the second actuator being configured to bend the programmable mask along with the first actuator such that the variable radius approximates the curvature of the fingernail received within the opening of the housing and underneath the programmable mask.

11. A nail polish system, comprising:
a housing having an opening configured to receive a fingernail of a finger, the housing containing:
a light assembly including circuitry configured to deliver an optical stimulus onto a photoresist nail polish on the fingernail;
a programmable mask configurable to selectively permit passage of a portion of the optical stimulus onto the photoresist nail polish, the programmable mask configured to generate one or more spaced-apart patterns of a dimension and character to form a plurality of photonic nanostructures within the photoresist nail polish, the programmable mask having a variable curvature; and
an actuator configured to bend the programmable mask such that the variable curvature of the programmable mask approximates a curvature of the fingernail received within the opening of the housing and underneath the programmable mask.

12. The nail polish system of claim 11 , wherein the programmable mask is a liquid crystal display (LCD) or a digital light processing screen (DLP).

13. The nail polish system of claim 11 , further comprising:
a controller configured to control light transmission properties of the programmable mask.

14. The nail polish system of claim 11 , further comprising a lens contained within the housing and configured to focus light onto the photoresist nail polish.

15. The nail polish system of claim 11 , further comprising;
a controller; and
a distance detector configured to measure a distance between the programmable mask and the photoresist nail polish on the fingernail received within the opening of the housing, and to provide the distance to the controller,
wherein the controller causes the actuator to bend the programmable mask based upon the distance between the programmable mask and the photoresist nail polish.

16. The nail polish system of claim 11 ,
wherein the actuator is a first actuator,
the nail polish system further comprising a second actuator connected to a different side of the programmable mask from the first actuator, the second actuator being configured to bend the programmable mask along with the first actuator such that the variable radius approximates the curvature of the fingernail received within the opening of the housing and underneath the programmable mask.

Assignees

• Oreal

Inventors

• Miller Zane Bowman Allen
• Casasanta Iii Vincenzo

Classifications

• G03F7/24 Primary

  Curved surfaces {(G03F7/70 takes precedence)} · CPC title

• G03F7/2057

  using an addressed light valve, e.g. a liquid crystal device · CPC title