Methods for producing an etch resist pattern on a metallic surface
US-2025198008-A1 · Jun 19, 2025 · US
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prepared from printing surfaces
prepared from printing surfaces · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/92 |
| Official title | prepared from printing surfaces |
| Display label | prepared from printing surfaces |
| Total patents | 13 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2018 | 1 |
| 2019 | 2 |
| 2020 | 1 |
| 2021 | 1 |
| 2022 | 2 |
| 2023 | 2 |
| 2024 | 2 |
| 2025 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Methods for producing an etch resist pattern on a metallic surface
US-12270111-B2 · Apr 8, 2025 · US
Random weight initialization of non-volatile memory array
US-12135497-B2 · Nov 5, 2024 · US
Methods for producing an etch resist pattern on a metallic surface
US-2024035167-A1 · Feb 1, 2024 · US
Methods for producing an etch resist pattern on a metallic surface
US-11807947-B2 · Nov 7, 2023 · US
Random weight initialization of non-volatile memory array
US-2023094719-A1 · Mar 30, 2023 · US
Methods for producing an etch resist pattern on a metallic surface
US-2022136113-A1 · May 5, 2022 · US
Methods for producing an etch resist pattern on a metallic surface
US-11255018-B2 · Feb 22, 2022 · US
Methods for producing an etch resist pattern on a metallic surface
US-2021007225-A1 · Jan 7, 2021 · US
Methods for producing an etch resist pattern on a metallic surface
US-10806035-B2 · Oct 13, 2020 · US
Technique for defining active regions of semiconductor devices with reduced lithography effort
US-2019043752-A1 · Feb 7, 2019 · US
Technique for defining active regions of semiconductor devices with reduced lithography effort
US-10199259-B1 · Feb 5, 2019 · US
Methods for producing an etch resist pattern on a metallic surface
US-2018242457-A1 · Aug 23, 2018 · US