Methods for producing an etch resist pattern on a metallic surface

Patent metadata

Field	Value
Publication number	US-10806035-B2
Application number	US-201615751866-A
Country	US
Kind code	B2
Filing date	Jul 27, 2016
Priority date	Aug 13, 2015
Publication date	Oct 13, 2020
Grant date	Oct 13, 2020

Abstract

A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface- activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch resist mask.

First claim

The invention claimed is:

1. A method of forming a metallic pattern on a substrate, the method comprising:
applying onto a surface of a metallic layer coupled to the substrate, a chemically surface-activating aqueous solution comprising an inorganic activating agent, wherein the inorganic activating agent chemically activates the metallic layer by forming ions from the metallic layer at the surface;
after chemically activating the metallic layer, non-impact printing droplets of an etch-resist ink onto the surface of the metallic layer to produce an etch-resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the metallic layer to immobilize the droplets of the etch-resist ink when the droplets of etch-resist ink contact the surface of the metallic layer;
performing an etching process to remove portions of the metallic layer that are not covered with the etch-resist mask; and
removing the etch-resist mask to form the metallic pattern.

2. The method of claim 1 , wherein the metallic pattern formed by performing the etching process comprises multiple metallic lines each of the multiple metallic lines having a width of less than 50 microns.

3. The method of claim 1 , wherein the etch-resist mask produced from the non-impact printing comprises lines having a width of less than 50 microns.

4. The method of claim 1 , wherein the metallic pattern formed by performing the etching process comprises metallic lines having a width of less than 30 microns.

5. The method of claim 1 , wherein the etch-resist mask produced from the non-impact printing comprises lines having a width of less than 30 microns.

6. The method of claim 1 , further comprising, prior to printing, removing the chemically surface-activating aqueous solution from the activated surface of the metallic layer using a solvent.

7. The method of claim 1 , wherein the ink component that undergoes the chemical reaction is an anionic component.

8. The method of claim 1 , wherein the ink component that undergoes the chemical reaction with the activated surface of the metallic layer is a polymeric component comprising an acrylate, a phosphate, a sulfonate, or any combination thereof.

9. The method of claim 1 , wherein the inorganic activating agent comprises one or more of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, sodium chlorite, and hydrogen peroxide.

10. The method of claim 1 , wherein applying the chemically surface-activating aqueous solution comprises immersing the metallic surface in a bath containing the chemically surface-activating aqueous solution for about 10-60 seconds.

11. The method of claim 1 , wherein applying the chemically surface-activating aqueous solution comprises spraying the chemically surface-activating aqueous solution onto the metallic surface.

12. The method of claim 1 , wherein non-impact printing the etch-resist ink on the activated surface of the metallic layer comprises ink-jet printing.

13. The method of claim 1 , wherein the chemical reaction comprises the formation of a matrix between the at least one ink component and the ions formed from the metallic layer.

14. The method of claim 13 , wherein the at least one ink component comprises a polymeric component and the matrix comprises a polymeric matrix in the droplets of the etch-resist ink on the surface of the metallic layer.

15. The method of claim 1 , wherein the etch-resistant ink further comprises a dye.

16. The method of claim 1 , wherein the chemical reaction increases a viscosity of the etch-resistant ink.

17. The method of claim 1 , wherein more than one ink component undergoes a chemical reaction with the metallic layer.

18. The method of claim 1 , wherein the metallic layer comprise copper and the ions from the metallic layer comprise copper cations.

19. The method of claim 18 , wherein the at least one ink component comprises an anionic component that undergoes the chemical reaction with the copper cations.

20. The method of claim 1 , wherein the inorganic activating agent comprises one or more of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, and sodium chlorite.

Assignees

• Kateeva Inc

Inventors

• Shpaisman Nava
• Frenkel Moshe

Classifications

• H05K2203/1173

  Differences in wettability, e.g. hydrophilic or hydrophobic areas · CPC title

• H05K2203/0582

  Coating by resist, i.e. resist used as mask for application of insulating coating or of second resist · CPC title

• H05K2203/0392

  Pretreatment of metal, e.g. before finish plating, etching · CPC title

• H05K2203/013

  Inkjet printing, e.g. for printing insulating material or resist · CPC title

• H05K3/061 Primary

  Etching masks · CPC title