Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask
US-10520818-B1 · Dec 31, 2019 · US
Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/30 |
| Official title | Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof |
| Display label | Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof |
| Total patents | 113 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 17 |
| 2016 | 14 |
| 2017 | 8 |
| 2018 | 11 |
| 2019 | 10 |
| 2020 | 16 |
| 2021 | 4 |
| 2022 | 14 |
| 2023 | 6 |
| 2024 | 5 |
| 2025 | 7 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Phase shifter mask
US-2019332003-A1 · Oct 31, 2019 · US
Photomask and methods for manufacturing and correcting photomask
US-2019332006-A1 · Oct 31, 2019 · US
Mask blank and phase shift mask using same
US-10444619-B2 · Oct 15, 2019 · US
Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor device
US-2019302604-A1 · Oct 3, 2019 · US
Semiconductor device, corresponding mask and method for generating layout of same
US-10417369-B2 · Sep 17, 2019 · US
Method for quickly establishing lithography process condition by a pre-compensation value
US-10409170-B2 · Sep 10, 2019 · US
Photomask and methods for manufacturing and correcting photomask
US-10394118-B2 · Aug 27, 2019 · US
Mask plate, display substrate, method for manufacturing display substrate, and display device
US-2019235669-A1 · Aug 1, 2019 · US
Photomask and a fabrication method therefor
US-10345692-B2 · Jul 9, 2019 · US
Semiconductor device, corresponding mask and method for generating layout of same
US-2018341736-A1 · Nov 29, 2018 · US
Photomask and methods for manufacturing and correcting photomask
US-2018321582-A1 · Nov 8, 2018 · US
Method for quickly establishing lithography process condition by a pre-compensation value
US-2018307143-A1 · Oct 25, 2018 · US
Device having write assist circuit including memory-adapted transistors and method for making the same
US-2018301185-A1 · Oct 18, 2018 · US
Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device
US-10088744-B2 · Oct 2, 2018 · US
Photomask and methods for manufacturing and correcting photomask
US-10048580-B2 · Aug 14, 2018 · US
Mask blank, method for manufacturing mask blank and transfer mask
US-10042247-B2 · Aug 7, 2018 · US
Photomask and fabrication method therefor
US-2018164675-A1 · Jun 14, 2018 · US
Photomask and a fabrication method therefor
US-2018149960-A1 · May 31, 2018 · US
Phase shift mask and method of forming patterns using the same
US-9977324-B2 · May 22, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F1/30?
- CPC G03F1/30 is the Cooperative Patent Classification code for “Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof.”
- How many patents are filed under CPC G03F1/30 (Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof)?
- Our database includes 113 publications tagged with this CPC code.
- Is patent activity under CPC G03F1/30 growing?
- Publication counts under this code: 5 in 2024 vs 7 in 2025 (latest complete years).