in illumination systems (mask illumination systems in photolithographic systems G03F7/70158)

in illumination systems (mask illumination systems in photolithographic systems G03F7/70158) · Cooperative Patent Classification (CPC)

Computing, optics, measurement, and control technologies.

Related technology areas

Mapped technology topics for this CPC code.

CPC classification statistics
MetricValue
CPC codeG02B27/425
Official title{in illumination systems (mask illumination systems in photolithographic systems G03F7/70158)}
Display labelin illumination systems (mask illumination systems in photolithographic systems G03F7/70158)
Total patents510

Filing trend

Year-over-year patent counts classified under this CPC code.

Filing activity over the last five years is rapidly declining.

Patents filed per year
YearPatents
201513
201627
201752
201832
201974
202098
202174
202244
202343
202435
202517
20261

Representative patents

Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.

Frequently asked questions

Answers are generated from the same data shown on this page.

What is CPC G02B27/425?
CPC G02B27/425 is the Cooperative Patent Classification code for “in illumination systems (mask illumination systems in photolithographic systems G03F7/70158).”
How many patents are filed under CPC G02B27/425 (in illumination systems (mask illumination systems in photolithographic systems G03F7/70158))?
Our database includes 510 publications tagged with this CPC code.
Is patent activity under CPC G02B27/425 growing?
Publication counts under this code: 35 in 2024 vs 17 in 2025 (latest complete years).