Microscope illumination system

Patent metadata

Field	Value
Publication number	US-9766446-B2
Application number	US-201615011240-A
Country	US
Kind code	B2
Filing date	Jan 29, 2016
Priority date	Mar 30, 2015
Publication date	Sep 19, 2017
Grant date	Sep 19, 2017

Abstract

An illumination system and method for operating the same is disclosed. The illumination system includes a spatial light modulator (SLM), first and second optical systems, a controller and a mask. The SLM is positioned to receive an incident light beam. The first optical system images light leaving the SLM onto the mask that blocks part of the light. The second optical system images light leaving the mask onto a sample to be illuminated. The controller causes the SLM to display an SLM pattern that generates an illumination beam and a spurious light beam from the incident light beam, the illumination beam passing through the mask, wherein the mask includes a fixed part having a plurality of openings and a moveable part that moves in relation to the fixed part and that includes an opening.

First claim

What is claimed is:

1. An illumination system comprising:
a spatial light modulator (SLM) positioned to receive an incident light beam;
a first optical system that images light leaving said SLM on a mask that blocks part of said light;
a second optical system that images light leaving said mask onto a sample to be illuminated; and
a controller that causes said SLM to display an SLM pattern that generates an illumination beam and a spurious light beam from said incident light beam, said illumination beam passing through said mask, wherein said mask comprises a fixed part having a plurality of openings and a moveable part that moves in relation to said fixed part and that includes an opening.

2. The illumination system of claim 1 wherein said incident light beam is a collimated linearly polarized light beam.

3. The illumination system of claim 1 wherein said SLM pattern comprises a pattern that diffracts part of said incident light beam to create said illumination beam.

4. The illumination system of claim 1 wherein said SLM comprises a transmissive SLM.

5. The illumination system of claim 1 wherein said SLM comprises a reflective SLM.

6. The illumination system of claim 1 wherein said opening in said moveable part is characterized by a distance from a reference point on said fixed part and wherein said reference point and said SLM pattern are determined by said controller in response to user input specifying one of a plurality of illumination patterns.

7. The illumination system of claim 1 wherein said fixed part of said mask comprises a transparent slot and a plurality of openings, said moveable part moving in relation to said fixed part such that said moveable part covers said slot, said opening in said moveable part providing an opening in said mask characterized by a position that can be changed by changing the position of said moveable part in said transparent slot.

8. The illumination system of claim 7 , wherein said openings in said fixed part are arranged in opposing pairs, each pair being centered on a reference point on said fixed part and wherein said slot is characterized by an axis that runs radially through said reference point, said moving part moving in a direction parallel to said axis.

9. The illumination system of claim 1 wherein light leaving said SLM comprises multiple light beams and wherein said mask blocks one of said multiple light beams.

10. The illumination system of claim 1 wherein said SLM pattern and said moveable part of said mask are configured such that light leaving said mask provides one of a plurality of predetermined illumination patterns, said one of said plurality of predetermined illumination patterns being determined by user input.

11. The illumination system of claim 10 wherein one of said plurality of predetermined illumination patterns is adapted for total internal reflection microscopy.

12. The illumination system of claim 10 wherein one of said plurality of predetermined illumination patterns is adapted for inclined illumination microscopy.

13. The illumination system of claim 10 wherein one of said plurality of predetermined illumination patterns is adapted for two dimensional structured illumination microscopy.

14. The illumination system of claim 10 wherein one of said plurality of predetermined illumination patterns is adapted for three dimensional structured illumination microscopy.

15. The illumination system of claim 10 wherein one of said plurality of predetermined illumination patterns is adapted for epifluorescence bright field microscopy.

16. A method for operating an apparatus to illuminate a sample, said method comprising:
directing an incident light beam onto a SLM to generate an illumination light beam and a spurious light beam, said SLM displaying an SLM pattern;
imaging said illumination light beam on a mask that blocks part of said spurious light beam while passing said illumination light beam; and
imaging light leaving said mask onto said sample,
wherein said mask comprises a fixed part having a plurality of openings and a moveable part that moves in relation to said fixed part and that includes an opening, said moveable part being positioned relative to said fixed part in a manner determined by one of a predetermined plurality of illumination modes.

17. The method of claim 16 wherein said SLM pattern diffracts part of said incident light beam to create said illumination beam.

18. The method of claim 16 wherein said SLM comprises a transmissive SLM.

19. The method of claim 16 wherein said SLM comprises a reflective SLM.

20. The method of claim 16 wherein said opening in said moveable part is characterized by a distance from a reference point on said fixed part and wherein said reference point and said SLM pattern are determined by user input specifying said one of said plurality of illumination modes.

Assignees

• Keysight Technologies Inc

Inventors

• Moertelmaier Manuel

Classifications

• G02B21/12

  affording bright-field illumination (G02B21/14 takes precedence) · CPC title

• G02B21/16 Primary

  adapted for ultraviolet illumination {; Fluorescence microscopes (G02B21/0076 takes precedence)} · CPC title

• G02B27/425

  in illumination systems (mask illumination systems in photolithographic systems G03F7/70158) · CPC title

• G02B21/0092

  Polarisation microscopes · CPC title

• G02B26/02

  for controlling the intensity of light {(G02B26/004 takes precedence)} · CPC title