Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices
US-11186772-B2 · Nov 30, 2021 · US
with acidic solutions
with acidic solutions · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23F3/06 |
| Official title | with acidic solutions |
| Display label | with acidic solutions |
| Total patents | 90 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 9 |
| 2016 | 9 |
| 2017 | 11 |
| 2018 | 8 |
| 2019 | 12 |
| 2020 | 9 |
| 2021 | 8 |
| 2022 | 4 |
| 2023 | 7 |
| 2024 | 3 |
| 2025 | 7 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Barrier Chemical Mechanical Planarization Slurries For Cobalt Films
US-2021301405-A1 · Sep 30, 2021 · US
Dual additive composition for polishing memory hard disks exhibiting edge roll off
US-2020224057-A1 · Jul 16, 2020 · US
Composition for tungsten cmp
US-2020208014-A1 · Jul 2, 2020 · US
Laminate for see-through electrodes, see-through electrode material, device and method for producing laminate for see-through electrodes
US-10691276-B2 · Jun 23, 2020 · US
Composition for tungsten CMP
US-10676647-B1 · Jun 9, 2020 · US
Method for manufacturing ceramic circuit board
US-2020170118-A1 · May 28, 2020 · US
Chemical process for matification
US-2020131646-A1 · Apr 30, 2020 · US
Chemical mechanical polishing composition and method for tungsten
US-10597558-B1 · Mar 24, 2020 · US
Chemical mechanical polishing method for tungsten
US-10600655-B2 · Mar 24, 2020 · US
Dishing reducing in tungsten chemical mechanical polishing
US-10570313-B2 · Feb 25, 2020 · US
Tungsten Chemical Mechanical Polishing Compositions
US-2019382619-A1 · Dec 19, 2019 · US
Performance enhancement of sensors through surface processing
US-2019381779-A1 · Dec 19, 2019 · US
Formulation and method for inhibiting carbon-based deposits
US-10428429-B2 · Oct 1, 2019 · US
Brightening and passivation of stainless steel surfaces
US-10392710-B2 · Aug 27, 2019 · US
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
US-10385236-B2 · Aug 20, 2019 · US
CMP compositions and methods for polishing nickel phosphorous surfaces
US-10358579-B2 · Jul 23, 2019 · US
Laminate for see-through electrodes, see-through electrode material, device and method for producing laminate for see-through electrodes
US-2019187841-A1 · Jun 20, 2019 · US
Chemical mechanical polishing method for tungsten
US-10286518-B2 · May 14, 2019 · US
Composition for tungsten cmp
US-2019085209-A1 · Mar 21, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23F3/06?
- CPC C23F3/06 is the Cooperative Patent Classification code for “with acidic solutions.”
- How many patents are filed under CPC C23F3/06 (with acidic solutions)?
- Our database includes 90 publications tagged with this CPC code.
- Is patent activity under CPC C23F3/06 growing?
- Publication counts under this code: 3 in 2024 vs 7 in 2025 (latest complete years).