Chemical solution, method for manufacturing chemical solution, and method for treating substrate
US-2023340326-A1 · Oct 26, 2023 · US
for etching refractory metals
for etching refractory metals · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23F1/38 |
| Official title | for etching refractory metals |
| Display label | for etching refractory metals |
| Total patents | 84 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 7 |
| 2016 | 10 |
| 2017 | 7 |
| 2018 | 7 |
| 2019 | 4 |
| 2020 | 6 |
| 2021 | 6 |
| 2022 | 8 |
| 2023 | 8 |
| 2024 | 10 |
| 2025 | 8 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for producing plasmonic-nanostructure spectrally selective solar absorber having high solar absorptance, low thermal emittance, and high thermal stability
US-2023168006-A1 · Jun 1, 2023 · US
Treatment liquid for semiconductors and method for producing same
US-2023126771-A1 · Apr 27, 2023 · US
Selective wet etch composition and method
US-2023121639-A1 · Apr 20, 2023 · US
Method and composition for etching molybdenum
US-2023030323-A1 · Feb 2, 2023 · US
Semiconductor wafer treatment liquid and prodution method thereof
US-2022411937-A1 · Dec 29, 2022 · US
Glass wiring board
US-11516907-B2 · Nov 29, 2022 · US
Method and composition for etching molybdenum
US-11492709-B2 · Nov 8, 2022 · US
Ruthenium etching composition and method
US-11346008-B2 · May 31, 2022 · US
Method for preparing titanium-containing implant by using environmentally-friendly etching composition
US-11280006-B2 · Mar 22, 2022 · US
Method for manufacturing ruthenium wiring
US-2022049361-A1 · Feb 17, 2022 · US
Method for inhibiting generation of ruthenium-containing gas from ruthenium-containing liquid
US-2022033976-A1 · Feb 3, 2022 · US
Chemical liquid and method for treating object to be treated
US-2022002622-A1 · Jan 6, 2022 · US
Method and composition for etching molybdenum
US-2021324525-A1 · Oct 21, 2021 · US
Surfactants for electronics products
US-2021292647-A1 · Sep 23, 2021 · US
Substrate processing liquid, substrate processing method and substrate processing apparatus
US-2021288172-A1 · Sep 16, 2021 · US
Etching solution for tungsten and GST films
US-11035044-B2 · Jun 15, 2021 · US
Glass wiring board
US-2021144847-A1 · May 13, 2021 · US
Semiconductor device and method for manufacturing the same
US-10916430-B2 · Feb 9, 2021 · US
Treatment liquid and treatment method
US-2020363725-A1 · Nov 19, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23F1/38?
- CPC C23F1/38 is the Cooperative Patent Classification code for “for etching refractory metals.”
- How many patents are filed under CPC C23F1/38 (for etching refractory metals)?
- Our database includes 84 publications tagged with this CPC code.
- Is patent activity under CPC C23F1/38 growing?
- Publication counts under this code: 10 in 2024 vs 8 in 2025 (latest complete years).