Delivery device, manufacturing system and process of manufacturing

Patent metadata

Field	Value
Publication number	US-10316408-B2
Application number	US-201514946115-A
Country	US
Kind code	B2
Filing date	Nov 19, 2015
Priority date	Dec 12, 2014
Publication date	Jun 11, 2019
Grant date	Jun 11, 2019

Abstract

A delivery device, manufacturing system, and process of manufacturing are disclosed. The delivery device includes a feed tube and a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from decomposition of dimethylsilane. The manufacturing system includes the delivery device and a chamber in selective fluid communication with the delivery device. The process of manufacturing uses the manufacturing system to produce an article.

First claim

What is claimed is:

1. A delivery device, comprising:
a feed tube; and
a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C.

2. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 10 psia.

3. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied under conditions of between 400° C. and 500° C.

4. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied for between 10 minutes and 24 hours.

5. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied for between 4 hours and 6 hours.

6. The delivery device of claim 1 , wherein the delivery device is positioned within an organic light emitting diode manufacturing system.

7. The delivery device of claim 1 , further comprising a processing material contained within the feed tube.

8. The delivery device of claim 7 , wherein the delivery device is arranged and disposed to direct the processing material towards a substrate to be coated.

9. The delivery device of claim 7 , wherein the processing material is an organic material.

10. The delivery device of claim 1 , wherein the chemical vapor deposition coating is oxidized.

11. The delivery device of claim 1 , wherein the chemical vapor deposition coating is functionalized.

12. The delivery device of claim 1 , wherein the chemical vapor deposition coating is treated with trimethylsilane.

13. The delivery device of claim 1 , wherein the inner surface is a pure or substantially pure metal surface.

14. The delivery device of claim 1 , wherein the inner surface is a metal alloy surface.

15. The delivery device of claim 1 , wherein the inner surface is an impure metal surface.

16. The manufacturing system of claim 1 , further comprising additional feed tubes.

17. A manufacturing system, comprising:
a delivery device having a feed tube, a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen; and
a chamber in selective fluid communication with the delivery device;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C. and the chemical vapor deposition coating is oxidized.

18. A delivery device, comprising:
a feed tube; and
a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the inner surface being a metal alloy surface, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen; and
a processing material contained within the feed tube, the processing material being an organic material;
wherein the delivery device is arranged and disposed to direct the processing material towards a substrate to be coated;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C. and the chemical vapor deposition coating is oxidized.

Assignees

• Silcotek Corp
• Aixtron Se

Inventors

• Smith David A
• Yuan Min
• Mattzela James B
• Wurzinger Olaf Martin
• Keiper Dietmar
• Haab Anna Katharina

Classifications

• C23C16/4402 Primary

  Reduction of impurities in the source gas · CPC title

• C23C16/44 Primary

  characterised by the method of coating (C23C16/04 takes precedence) · CPC title

• C23C16/24

  Deposition of silicon only · CPC title

• C23C16/4404

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• C23C14/564

  Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title