Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources
US-12258661-B2 · Mar 25, 2025 · US
Microwaves, e.g. electron cyclotron resonance enhanced sputtering
Microwaves, e.g. electron cyclotron resonance enhanced sputtering · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C14/357 |
| Official title | {Microwaves, e.g. electron cyclotron resonance enhanced sputtering} |
| Display label | Microwaves, e.g. electron cyclotron resonance enhanced sputtering |
| Total patents | 29 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 4 |
| 2017 | 1 |
| 2018 | 2 |
| 2019 | 1 |
| 2020 | 3 |
| 2021 | 5 |
| 2022 | 5 |
| 2023 | 3 |
| 2024 | 1 |
| 2025 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Sputtering device with microwave heating mechanism
US-12195842-B2 · Jan 14, 2025 · US
Method for deposition of dense chromium on a substrate
US-2024209493-A1 · Jun 27, 2024 · US
Modular microwave source with local lorentz force
US-11721532-B2 · Aug 8, 2023 · US
Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources
US-2023067917-A1 · Mar 2, 2023 · US
Method for the surface treatment of a jewel, in particular for the watchmaking industry
US-2023002882-A1 · Jan 5, 2023 · US
Sputtering device
US-2022267893-A1 · Aug 25, 2022 · US
Carbon layer covered mask in 3D applications
US-11384428-B2 · Jul 12, 2022 · US
Method for improving service life of magnetron
US-2022136098-A1 · May 5, 2022 · US
Method for vapor depositing a substrate
US-11293090-B2 · Apr 5, 2022 · US
Alternating Current (AC) Dual Magnetron Sputtering
US-2022093363-A1 · Mar 24, 2022 · US
Modular microwave source with local lorentz force
US-2021287882-A1 · Sep 16, 2021 · US
Device for producing an amorphous carbon layer by electron cyclotron resonance plasma
US-11075061-B2 · Jul 27, 2021 · US
Modular microwave source with local Lorentz force
US-11037764-B2 · Jun 15, 2021 · US
Vapor deposition method and vapor deposition apparatus
US-2021156022-A1 · May 27, 2021 · US
Carbon layer covered mask in 3d applications
US-2021017641-A1 · Jan 21, 2021 · US
Physical vapor deposition in-chamber electro-magnet
US-10867776-B2 · Dec 15, 2020 · US
Method for hardening an anti-reflection treatment deposited on a transparent substrate and transparent substrate comprising a hardened anti-reflection treatment
US-2020331801-A1 · Oct 22, 2020 · US
Plasma spray systems and methods
US-2020040444-A1 · Feb 6, 2020 · US
Physical vapor deposition in-chamber electro-magnet
US-2019348259-A1 · Nov 14, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C14/357?
- CPC C23C14/357 is the Cooperative Patent Classification code for “Microwaves, e.g. electron cyclotron resonance enhanced sputtering.”
- How many patents are filed under CPC C23C14/357 (Microwaves, e.g. electron cyclotron resonance enhanced sputtering)?
- Our database includes 29 publications tagged with this CPC code.
- Is patent activity under CPC C23C14/357 growing?
- Publication counts under this code: 1 in 2024 vs 2 in 2025 (latest complete years).