Resist composition
US-2016377980-A1 · Dec 29, 2016 · US
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00)
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00) · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F224/00 |
| Official title | Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00) |
| Display label | Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00) |
| Total patents | 241 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 21 |
| 2016 | 43 |
| 2017 | 36 |
| 2018 | 42 |
| 2019 | 16 |
| 2020 | 23 |
| 2021 | 8 |
| 2022 | 14 |
| 2023 | 10 |
| 2024 | 10 |
| 2025 | 15 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Polymer, chemically amplified positive resist composition and patterning process
US-2016370702-A1 · Dec 22, 2016 · US
Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
US-2016347897-A1 · Dec 1, 2016 · US
Polymer, monomer, resist composition, and patterning process
US-2016342086-A1 · Nov 24, 2016 · US
Azetidinium-containing copolymers and uses thereof
US-2016326395-A1 · Nov 10, 2016 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
US-2016320700-A1 · Nov 3, 2016 · US
Method of producing polymeric compound, resist composition and method of forming resist pattern
US-9469712-B2 · Oct 18, 2016 · US
Transparent frozen soil and preparation method and application thereof
US-2016290898-A1 · Oct 6, 2016 · US
Radiation-sensitive resin composition, polymer and compound
US-9459532-B2 · Oct 4, 2016 · US
Application of a fluorine-containing polymer in preparation of transparent frozen soil
US-2016244545-A1 · Aug 25, 2016 · US
Efficient collection of nanoparticles
US-2016244547-A1 · Aug 25, 2016 · US
Azetidinium-containing copolymers and uses thereof
US-9422447-B2 · Aug 23, 2016 · US
Hemiacetal compound, polymer, resist composition, and patterning process
US-2016238930-A1 · Aug 18, 2016 · US
Compound, resin and photoresist composition
US-2016237190-A1 · Aug 18, 2016 · US
Polymer, resist composition, and pattern forming process
US-2016229940-A1 · Aug 11, 2016 · US
Renewable Bio-Based (Meth)Acrylated Monomers as Vinyl Ester Cross-Linkers
US-2016222149-A1 · Aug 4, 2016 · US
Transparent frozen soil and preparation method and application thereof
US-2016216247-A1 · Jul 28, 2016 · US
Monomer, polymer, resist composition, and patterning process
US-2016179002-A1 · Jun 23, 2016 · US
Polymer, resist composition, and pattern forming process
US-2016168296-A1 · Jun 16, 2016 · US
Bonding composition and component thereof, and method of using the same
US-2016160085-A1 · Jun 9, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F224/00?
- CPC C08F224/00 is the Cooperative Patent Classification code for “Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00).”
- How many patents are filed under CPC C08F224/00 (Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00))?
- Our database includes 241 publications tagged with this CPC code.
- Is patent activity under CPC C08F224/00 growing?
- Publication counts under this code: 10 in 2024 vs 15 in 2025 (latest complete years).