Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition
US-9291892-B2 · Mar 22, 2016 · US
Resist composition
US2016377980A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016377980-A1 |
| Application number | US-201615192231-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 24, 2016 |
| Priority date | Jun 26, 2015 |
| Publication date | Dec 29, 2016 |
| Grant date | — |
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- Title
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Abstract
Official abstract text for this publication.
A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom, L 1 represents a single bond or *-L 2 -CO—O-(L 3 -CO—O) g — where * represents a binding position to an oxygen atom, L 2 and L 3 independently represent a C 1 to C 12 divalent hydrocarbon group, g represents 0 or 1, and R 3 represents a C 1 to C 12 liner or branched alkyl group except for a tertiary alkyl group.
First claim
Opening claim text (preview).
What is claimed is: 1 . A resist composition comprising a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom, L 1 represents a single bond or *-L 2 -CO—O-(L 3 -CO—O) g —, * represents a binding position to an oxygen atom, L 2 and L 3 independently represent a C 1 to C 12 divalent hydrocarbon group, g represents 0 or 1, and R 3 represents a C 1 to C 12 liner or branched alkyl group except for a tertiary alkyl group. 2 . The resist composition according to claim 1 , wherein L 1 is a single bond. 3 . The resist composition according to claim 1 , wherein R 3 is a C 2 to C 8 liner alkyl group. 4 . The resist composition according to claim 1 further comprising a resin (A2) which has a structural unit having a fluorine atom and no structural unit having an acid-labile group.
Assignees
Inventors
Classifications
- G03F7/0397Primary
the macromolecular compound having an alicyclic moiety in a side chain · CPC title
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F218/00; cyclic anhydrides of unsaturated acids C08F220/00, C08F222/00) · CPC title
and containing two or more oxygen atoms · CPC title
containing perhaloalkyl radicals · CPC title
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
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- What does patent US2016377980A1 cover?
- A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl g…
- Who is the assignee on this patent?
- Sumitomo Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0397. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Thu Dec 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).