Additives for orientation control of block copolymers
US-10066040-B2 · Sep 4, 2018 · US
Fluorine
Fluorine · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F212/20 |
| Official title | {Fluorine} |
| Display label | Fluorine |
| Total patents | 211 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 17 |
| 2016 | 28 |
| 2017 | 13 |
| 2018 | 27 |
| 2019 | 22 |
| 2020 | 20 |
| 2021 | 16 |
| 2022 | 14 |
| 2023 | 22 |
| 2024 | 19 |
| 2025 | 9 |
| 2026 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Pattern forming process and shrink agent
US-9927708-B2 · Mar 27, 2018 · US
Block copolymer
US-2017306074-A1 · Oct 26, 2017 · US
Conductive polymer composite and substrate
US-9752045-B2 · Sep 5, 2017 · US
Block copolymer
US-2017247492-A1 · Aug 31, 2017 · US
Conductive polymer composite and substrate
US-2017233596-A1 · Aug 17, 2017 · US
Conductive material and substrate
US-2017174922-A1 · Jun 22, 2017 · US
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
US-2017168394-A1 · Jun 15, 2017 · US
Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device
US-9618665-B2 · Apr 11, 2017 · US
Polymer compound for a conductive polymer and method for producing same
US-2017058059-A1 · Mar 2, 2017 · US
Radiation-sensitive or actinic ray-sensitive resin composition, resist film using the same, mask blank, resist pattern forming method, electronic device manufacturing method, and electronic device
US-2017059990-A1 · Mar 2, 2017 · US
Block copolymer
US-2017058071-A1 · Mar 2, 2017 · US
Conductive polymer composite and substrate
US-2017058144-A1 · Mar 2, 2017 · US
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
US-9551933-B2 · Jan 24, 2017 · US
Block copolymer
US-2017008992-A1 · Jan 12, 2017 · US
Polymer compound for a conductive polymer and method for producing same
US-9527937-B2 · Dec 27, 2016 · US
Additives for orientation control of block copolymers
US-2016362513-A1 · Dec 15, 2016 · US
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, resist pattern forming method, and photomask
US-2016342090-A1 · Nov 24, 2016 · US
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
US-9500951-B2 · Nov 22, 2016 · US
Polymer compound having a specific super strongly acidic sulfo group
US-9493597-B2 · Nov 15, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F212/20?
- CPC C08F212/20 is the Cooperative Patent Classification code for “Fluorine.”
- How many patents are filed under CPC C08F212/20 (Fluorine)?
- Our database includes 211 publications tagged with this CPC code.
- Is patent activity under CPC C08F212/20 growing?
- Publication counts under this code: 19 in 2024 vs 9 in 2025 (latest complete years).