Method for the synthesis of acrylic (co)polymers from oligomers of acrylic acid
US-10941231-B2 · Mar 9, 2021 · US
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Acids; Metal salts or ammonium salts thereof
Acids; Metal salts or ammonium salts thereof · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F20/64 |
| Official title | Acids; Metal salts or ammonium salts thereof |
| Display label | Acids; Metal salts or ammonium salts thereof |
| Total patents | 14 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 6 |
| 2017 | 2 |
| 2018 | 2 |
| 2021 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for the synthesis of acrylic (co)polymers from oligomers of acrylic acid
US-2018346625-A1 · Dec 6, 2018 · US
Binder composition for non-aqueous secondary battery electrode, slurry composition for non-aqueous secondary battery electrode, electrode for non-aqueous secondary battery, and non-aqueous secondary battery
US-2018258202-A1 · Sep 13, 2018 · US
Processes of preparing estolide compounds that include removing sulfonate residues
US-9783484-B2 · Oct 10, 2017 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9546133-B2 · Jan 17, 2017 · US
Processes of preparing estolide compounds that include removing sulfonate residues
US-2016340289-A1 · Nov 24, 2016 · US
Polymers having chelating functionality
US-9346899-B2 · May 24, 2016 · US
Processes of preparing estolide compounds that include removing sulfonate residues
US-9346900-B2 · May 24, 2016 · US
Compositions with ph responsive copolymer containing maep and/or mahp and methods for using same
US-2016113856-A1 · Apr 28, 2016 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-2016023992-A1 · Jan 28, 2016 · US
Compositions with pH responsive copolymer containing MAEP and/or MAHP and method for using same
US-9228041-B2 · Jan 5, 2016 · US
Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
US-9216948-B2 · Dec 22, 2015 · US
Processes of preparing estolide compounds that include removing sulfonate residues
US-2015315306-A1 · Nov 5, 2015 · US
Processes of preparing estolide compounds that include removing sulfonate residues
US-9040729-B2 · May 26, 2015 · US