Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer

US9546133B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9546133-B2
Application numberUS-201514877081-A
CountryUS
Kind codeB2
Filing dateOct 7, 2015
Priority dateApr 21, 2011
Publication dateJan 17, 2017
Grant dateJan 17, 2017

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  1. Title

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  2. Abstract

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Abstract

Official abstract text for this publication.

A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 μm, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for purifying a polymerization initiator to be used in production of a polymer, said method comprising a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 μm, to reduce the sodium content of said polymerization initiator solution to not more than 300 ppb with respect to the weight of said polymerization initiator. 2. The method for purifying a polymerization initiator according to claim 1 , wherein said filter is a membrane filter. 3. The method for purifying a polymerization initiator according to claim 1 , wherein said filter is a hollow fiber membrane filter. 4. The method for purifying a polymerization initiator according to claim 1 , wherein a filter material of said filter is made of polyolefin. 5. The method for purifying a polymerization initiator according to claim 1 , wherein a filter material of said filter is made of a fluorocarbon polymer. 6. The method for purifying a polymerization initiator according to claim 1 , wherein said filter is a filter having ion-exchange capacity. 7. The method for purifying a polymerization initiator according to claim 1 , wherein said filter is a filter having a zeta potential.

Assignees

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Classifications

  • Oxygen or compounds releasing free oxygen (redox systems C08F4/40) · CPC title

  • Acyclic compounds · CPC title

  • Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof · CPC title

  • Esters containing oxygen in addition to the carboxy oxygen · CPC title

  • Hollow fibre membranes (manufacture of hollow fibres D01D5/24, D01F1/08) · CPC title

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What does patent US9546133B2 cover?
A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent…
Who is the assignee on this patent?
Maruzen Petrochem Co Ltd
What technology area does this patent fall under?
Primary CPC classification C07C245/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 17 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).