Polymer, composition, optical film, and liquid crystal display device
US-10487165-B2 · Nov 26, 2019 · US
Esters containing halogen
Esters containing halogen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F20/22 |
| Official title | Esters containing halogen |
| Display label | Esters containing halogen |
| Total patents | 134 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 14 |
| 2017 | 19 |
| 2018 | 12 |
| 2019 | 11 |
| 2020 | 19 |
| 2021 | 10 |
| 2022 | 7 |
| 2023 | 19 |
| 2024 | 4 |
| 2025 | 7 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Methods of making crosslinked copolymer films from inimer-containing random copolymers
US-10465087-B2 · Nov 5, 2019 · US
Monomer, polymer, resist composition, and patterning process
US-2019235381-A1 · Aug 1, 2019 · US
Composition, modification method and selective modification method of base material surface, pattern-forming method, and polymer
US-2019194365-A1 · Jun 27, 2019 · US
Conductive polymer composition, coated article, and patterning process
US-10295906-B2 · May 21, 2019 · US
Fluorine-containing highly branched polymer and resin composition containing the same
US-10227457-B2 · Mar 12, 2019 · US
Resin composition and molded body
US-2019055394-A1 · Feb 21, 2019 · US
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
US-2019025695-A1 · Jan 24, 2019 · US
Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same
US-2019016887-A1 · Jan 17, 2019 · US
Method for producing polymerizable compound
US-2018354922-A1 · Dec 13, 2018 · US
Polymer compound for a conductive polymer and method for producing same
US-10125202-B2 · Nov 13, 2018 · US
Inimer-containing random copolymers and crosslinked copolymer films for dense polymer brush growth
US-10106699-B2 · Oct 23, 2018 · US
Resist composition, method of forming resist pattern, fluorine-containing compound, and compound
US-2018284606-A1 · Oct 4, 2018 · US
Curable composition and cured product
US-2018273656-A1 · Sep 27, 2018 · US
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
US-10082733-B2 · Sep 25, 2018 · US
Monomer, polymer, resist composition, and patterning process
US-10054853-B2 · Aug 21, 2018 · US
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
US-10048586-B2 · Aug 14, 2018 · US
Monomer, polymer, resist composition, and patterning process
US-10023674-B2 · Jul 17, 2018 · US
Conductive polymer composite and substrate
US-9991019-B2 · Jun 5, 2018 · US
Photocurable composition, pattern forming method, and method for manufacturing device
US-2018120698-A1 · May 3, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F20/22?
- CPC C08F20/22 is the Cooperative Patent Classification code for “Esters containing halogen.”
- How many patents are filed under CPC C08F20/22 (Esters containing halogen)?
- Our database includes 134 publications tagged with this CPC code.
- Is patent activity under CPC C08F20/22 growing?
- Publication counts under this code: 4 in 2024 vs 7 in 2025 (latest complete years).