Inimer-containing random copolymers and crosslinked copolymer films for dense polymer brush growth

Patent metadata

Field	Value
Publication number	US-10106699-B2
Application number	US-201414168383-A
Country	US
Kind code	B2
Filing date	Jan 30, 2014
Priority date	Feb 20, 2013
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

Crosslinkable random copolymers comprising atom transfer radical polymerization (ATRP) initiators and crosslinked copolymer films formed from the copolymers are provided. The random copolymers, which are polymerized from one or more alkyl halide functional inimers and one or more monomers having a crosslinkable functionality, are characterized by pendant ATRP initiating groups and pendant crosslinkable groups.

First claim

What is claimed is:

1. A method of forming a self-assembled block copolymer film using a crosslinked copolymer film on a substrate surface, the crosslinked copolymer film comprising crosslinked random copolymer chains, wherein the random copolymer is a copolymer of a first monomer comprising an alkyl halide functional group that is capable of acting as an ATRP initiator, and a second monomer, and further wherein the alkyl halide functional groups are pendant groups on the backbone of the random copolymer chains and the crosslinks between the random copolymer chains are formed between crosslinkable functional groups on the second monomers, the method comprising:
patterning the crosslinked copolymer film to provide a plurality of regions comprising the alkyl halide functional groups that are capable of acting as ATRP initiators and a plurality of regions that do not have ATRP initiating functional groups;
exposing the crosslinked copolymer film to a solution comprising polymerizable monomers and a transition metal complex under reaction conditions in which the alkyl halide functional groups initiate the polymerization of the polymerizable monomers into a polymer brush via atom transfer radical polymerization to provide a patterned polymer brush layer; and
depositing a block copolymer film over the patterned polymer brush layer, wherein the patterned polymer brush layer induces the block copolymer to self-assemble into patterned domains;
wherein the first monomer is selected from acrylate monomers having an alkyl halide functional group, methacrylate monomers having an alkyl halide functional group, styrene monomers having an alkyl halide functional group, or combinations thereof, and
wherein the crosslinked copolymer film has a halogen atom density of at least 1.5 atoms/nm3.

2. The method of claim 1 , wherein the crosslinkable functional groups comprise thermally self-crosslinking functional groups.

3. The method of claim 1 , wherein the crosslinkable functional groups comprise thermally crosslinkable epoxy groups.

4. The method of claim 1 , wherein the crosslinkable functional groups comprise thermally crosslinkable epoxy groups.

5. The method of claim 1 , wherein the polymer brushes have a grafting density of at least 0.5 brush polymer chains per nm 2 .

6. The method of claim 1 , wherein the crosslinked copolymer film is not covalently bonded to the substrate surface.

7. The method of claim 1 further comprising selectively removing one of the patterned domains from the self-assembled block copolymer to form a mask having a pattern over the substrate surface and transferring the pattern of the mask into the substrate surface.

8. The method of claim 7 , wherein the first monomer is p-(2-bromoisobutyloylmethyl)styrene, the second monomer is glycidyl methacrylate, the polymer brush is a polymethyl methacrylate polymer brush, and the block copolymer is a polystyrene-block-polymethyl methacrylate block copolymer.

9. The method of claim 1 , wherein the first monomer is p-(2-bromoisobutyloylmethyl)styrene and the second monomer is glycidyl methacrylate.

Assignees

• Wisconsin Alumni Res Found

Inventors

• Gopalan Padma
• Sweat Daniel P
• Kim Myungwoong

Classifications

• C08F2438/01

  Atom Transfer Radical Polymerization [ATRP] or reverse ATRP · CPC title

• C08F212/21

  Bromine · CPC title

• C08J2327/10

  containing bromine or iodine atoms · CPC title

• C08F220/22

  Esters containing halogen · CPC title

• B81C2201/0149

  Forming nanoscale microstructures using auto-arranging or self-assembling material · CPC title